“… 8 − 11 The understanding of the basic mechanisms governing the process allowed expanding the list of materials that can be grown using this technique. In particular, the growth of several oxides, like Al 2 O 3 , TiO 2 , 12 ZnO, 12 − 15 WO x , 16 VO x , 12 In 2 O 3 , 17 , 18 Ga 2 O 3 , 18 and SnO 2 , 19 has been already reported in the literature for different applications, such as high-resolution hard masks, 20 − 25 nanoparticle coatings and decoration, 8 , 26 , 27 superhydrophobic coatings, 28 optical materials and antireflection coatings, 29 , 30 enhancer of the contrast and scattering of nanostructures, 24 , 31 , 32 3D superlattices, 33 oil sorbents, 34 UV and thermal protection, 14 tuning of mechanical propertries, 35 sensing applications, 15 membranes, 36 − 38 elastic energy-storage structures, 39 electrical devices, 13 , 17 , 40 , 41 and resistive switching devices. 42 In addition, SIS can be also exploited as a postlithography technique to improve the extreme ultraviolet patterning process.…”