The manufacturing of a 3D interconnected globular carbon foam, called Globugraphite, is based on the replication of the zinc oxide (ZnO) template morphology by carbon with simultaneous removing of the template material in the chemical vapour deposition (CVD -replica CVD (rCVD)) process. The growth mechanism of the presented carbon foam affected the formation of defects at the atomic level which leads in the following to graphitic pieces instead of layers. This substructure influences properties, such as electrical conductivity of the carbon foam negatively. By undergoing a temperature treatment at 1600°C, 1800°C, 2000°C and 2200°C in a protective gas atmosphere the carbon structure heals at the atomic level. The connection of the sp 2 /sp 3 graphitic pieces to graphitic sp 2 layers due to the thermal annealing is analysed via transmission electron microscopy (TEM) observation and Raman spectroscopy. Based on these analysis methods a model of the graphitization progress is created which explains the clearly increase of the electrical conductivity and the oxidation temperature.