Hydrofluoric acid etching of dental zirconia. Part 2: effect on flexural strength and ageing behavior

Flamant, Quentin; Anglada, M.

doi:10.1016/j.jeurceramsoc.2015.09.022

Cited by 26 publications

(16 citation statements)

References 27 publications

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“…This indicates that although the average roughness, the surface material volume and the surface core void volume do not increase substantially after one hour, localized events such as etching pits likely become bigger. This was confirmed by topographical images ( Figure 7) and is not desirable from the mechanical point of view since those localized events could act as defects originating fracture [18]. On the other hand, it has to be noticed that for the functional indexes S bi , S ci and S vi the transition seems to happen around thirty minutes.…”

Section: Evolution Of the Surface Topography Over Etching Timementioning

confidence: 71%

“…The objectives of the present work are therefore to determine suitable conditions for a fast and uniform roughening of dental zirconia, to provide a complete surface characterization with a special emphasis on topography and to contribute to the understanding of the etching mechanism. Questions related to the influence of etching on the mechanical properties and long-term reliability are treated in a second article [18].…”

Section: Introductionmentioning

confidence: 99%

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Hydrofluoric acid etching of dental zirconia. Part 1: etching mechanism and surface characterization

Flamant

Marro

Rovira

et al. 2016

Journal of the European Ceramic Society

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Rough surfaces have been shown to promote osseointegration, which is one of the keys for a successful dental implantation. Among the diverse treatments proposed to roughen zirconia, hydrofluoric acid (HF) etching appears to be a good candidate, however little is known about this process. In this work, the effect of HF concentration and etching time on the surface topography and chemistry of yttria-stabilized zirconia was assessed.Besides, to understand the etching mechanism, the reaction products present in solution and on the surface were characterized. The results indicate suitable parameters for a fast and uniform roughening of zirconia. The formation of adhered fluoride precipitates on the surface is reported for the first time and highlights the importance of cleaning after etching. Finally, it is shown that monitoring the time allows controlling the surface roughness, smooth-rough transition and fractal dimension, which should make possible the fabrication of implants with an optimal topography.

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Section: Evolution Of the Surface Topography Over Etching Timementioning

confidence: 71%

Section: Introductionmentioning

confidence: 99%

Hydrofluoric acid etching of dental zirconia. Part 1: etching mechanism and surface characterization

Flamant

Marro

Rovira

et al. 2016

Journal of the European Ceramic Society

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“…In addition to these topographical changes, previous works showed that HF etching induces an increase in the fluorine content of the surface 31 and the formation of a superficial submicrometric porosity. 32 Nevertheless, these surface alterations were shown to be nearly independent from etching time. Surface structural and chemical changes along the gradients can thus be considered as negligible.…”

Section: Discussionmentioning

confidence: 98%

“…As shown in Figure , the samples were immersed into a volume of 40 mL of HF contained in a polyethylene flask at a speed of 0.6 mm/min by using an automated device (ND‐R Rotary Dip Coater, Nadetech Innovations, Spain). The total duration of the process was set to 1 h, which leads to a substantial roughness for the part of the sample immersed for the longest time without damaging too severely the material . After etching, the specimens were rinsed with deionized water in order to stop the reaction.…”

Section: Methodsmentioning

confidence: 99%

“…The total duration of the process was set to 1 h, which leads to a substantial roughness for the part of the sample immersed for the longest time without damaging too severely the material. 31,32 After etching, the specimens were rinsed with deionized water in order to stop the reaction. Finally, they were cleaned in an ultrasonic bath (2 3 10 min with fresh deionized water) to remove the precipitates formed during the process.…”

Section: Sample Fabricationmentioning

confidence: 99%

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Roughness gradients on zirconia for rapid screening of cell‐surface interactions: Fabrication, characterization and application

Flamant

Stanciuc

Pavailler

et al. 2016

J Biomedical Materials Res

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Roughness is one of the key parameters for successful osseointegration of dental implants. The understanding of how roughness affects cell response is thus crucial to improve implant performance. Surface gradients, which allow rapid and systematic investigations of cell-surface interactions, have the potential to facilitate this task. In this study, a novel method aiming to produce roughness gradients at the surface of zirconia using hydrofluoric acid etching was implemented. The topography was exhaustively characterized at the microscale and nanoscale by white light interferometry and atomic force microscopy, including the analysis of amplitude, spatial, hybrid, functional, and fractal parameters. A rapid screening of the influence of roughness on human mesenchymal stem cell morphology was conducted and potential correlations between roughness parameters and cell morphology were investigated. The roughness gradient induced significant changes in cell area (p < 0.001), aspect ratio (p = 0.01), and solidity (p = 0.026). Nanoroughness parameters were linearly correlated to cell solidity (p < 0.005), while microroughness parameters appeared nonlinearly correlated to cell area, highlighting the importance of multiscale optimization of implant topography to induce the desired cell response. The gradient method proposed here drastically reduces the efforts and resources necessary to study cell-surface interactions and provides results directly transferable to industry. © 2016 Wiley Periodicals, Inc. J Biomed Mater Res Part A: 104A: 2502-2514, 2016.

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Critical effects of thermal processing conditions on grain size and microstructure of dental Y-TZP during layering and glazing

et al. 2023

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The grain size of 3Y-TZP is critical because it must remain below a certain size in order to remain tetragonal during aging in the oral cavity. However, fabrication protocols regularly do not accommodate this critical size factor. Nevertheless, grain size measurements generally are not considered or undertaken. Further, when they are, they are thermally etched, which alters the material by grain growth. The didactic purpose of the present work is to provide a strategy for the application of suitable experimental methods for the examination of grain growth in 3Y-TZP, without the risk of grain growth during thermal etching. Examination of the effects of the different applicable thermal conditions is done in order to demonstrate the extents of grain growth in dental restorations following sintering, layering, and glazing. 3Y-TZP nanoscale powders were prepared by coprecipitation using aqueous solutions of zirconyl nitrate and yttrium nitrate, precipitated by ammonium hydroxide, and calcined at 800 °C. Uniaxially and cold isostatically pressed disks were bisque-fired at 800 °C for 2 h, after which they were planed and polished (0.1 μm). The 27 samples were sintered at 1400 ºC, 1500 ºC, or 1600 °C for 1, 2, or 4 h. They then were post-treated by annealing at 750 °C for 1 min under mechanical vacuum and then by post-annealing at 750 °C for 1 min in air. As the pre-polish was retained following sintering, SEM images could be used to determine the grain sizes by standard grain size measurement methods without having to impose thermal etching. These data then were implemented in a grain growth kinetics assessment. The pre-polishing procedure and SEM imaging were successful in enabling accurate grain size measurements without sample alteration. The grain growth as a function of temperature and time exhibited trends approximately logarithmic and linear, respectively. The diffusion mechanism was suggested to be of boundary control by a high-solubility solute in a doped system. Significantly, only sintering at 1400 °C for 1–2 h retained the grain size below the critical limit of ~ 300 nm for resistance to aging in the oral cavity. Also, significantly, ~ 7% grain growth, with a range of 2–14%, occurred during the modest thermal conditions used for both annealing and post-annealing. Sintering, annealing, and post-annealing reduce the number of grain boundaries and hence reduce light scattering, resulting in increasing translucency. Further, the use of the lower sintering temperature of 1400 °C still can yield a very high bulk density (≥ 99.62%), but with a relative increase in light scattering and reduced translucency, making this more suitable for masking dark stump shades. More critically, this sintering temperature for only 1–2 h is necessary in order to avoid risk of the tetragonal → monoclinic phase transformation during the aging process. Further, these conditions are sufficient to allow a limited number of layering and glazing procedures.

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Hydrofluoric acid etching of dental zirconia. Part 2: effect on flexural strength and ageing behavior

Cited by 26 publications

References 27 publications

Hydrofluoric acid etching of dental zirconia. Part 1: etching mechanism and surface characterization

Hydrofluoric acid etching of dental zirconia. Part 1: etching mechanism and surface characterization

Roughness gradients on zirconia for rapid screening of cell‐surface interactions: Fabrication, characterization and application

Critical effects of thermal processing conditions on grain size and microstructure of dental Y-TZP during layering and glazing

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