2019
DOI: 10.1039/c8sm02144a
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Hydrogen bonding-based strongly adhesive coacervate hydrogels synthesized using poly(N-vinylpyrrolidone) and tannic acid

Abstract: A supramolecular coacervate hydrogel was synthesized by simply mixing poly(N-vinylpyrrolidone) (PVP) and tannic acid (TA). Resulting super adhesive properties showed adhesion strength of 3.71 MPa on a glass substrate.

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Cited by 147 publications
(102 citation statements)
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“…In summary, due to the large number of phenol groups with both an acidic and hydrogen‐bonding donor characteristics, TA can interact effectively and strongly with the t ‐amide groups of PEOX to form either a coacervate or complex gel via multiple interactions with hydrogen bonding in aqueous solutions. In other reports, the hydrogen bonding complex formation between TA and poly( N ‐vinylpyrrolidone) or other water‐soluble polymers has been investigated previously …”
Section: Resultsmentioning
confidence: 99%
“…In summary, due to the large number of phenol groups with both an acidic and hydrogen‐bonding donor characteristics, TA can interact effectively and strongly with the t ‐amide groups of PEOX to form either a coacervate or complex gel via multiple interactions with hydrogen bonding in aqueous solutions. In other reports, the hydrogen bonding complex formation between TA and poly( N ‐vinylpyrrolidone) or other water‐soluble polymers has been investigated previously …”
Section: Resultsmentioning
confidence: 99%
“…As observed in these results, the majority of the samples exhibited sufficient bonded interfacial strength to endure a series of optoelectronic device fabrication processes and user operations. The hydrogen bonds stemming from PAM presumably cause the adhesion to the semiconductor surfaces [20,21]. More specifically, hydrogen bonds may form between the -NH 2 groups of PAM and the Si surface terminated by -OH groups, owing to the water contained in PAM [20].…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The hydrogen bonds stemming from PAM presumably cause the adhesion to the semiconductor surfaces [20,21]. More specifically, hydrogen bonds may form between the -NH 2 groups of PAM and the Si surface terminated by -OH groups, owing to the water contained in PAM [20]. In addition, the PAM matrix holds the WCM particles, suppressing their sedimentation.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The hydrogen bonds from PAM may cause the adhesion to semiconductor surfaces. 35,36 More specifically, hydrogen bonds are presumably formed between the ÀNH 2 groups of PAM and the Si surface terminated by ÀOH groups due to the water contained in PAM. 35 The PAM film had an approximate thickness of 5 lm, larger than typical diameters of particles in a regular, noncleanroom environment (< 3 lm).…”
mentioning
confidence: 99%
“…35,36 More specifically, hydrogen bonds are presumably formed between the ÀNH 2 groups of PAM and the Si surface terminated by ÀOH groups due to the water contained in PAM. 35 The PAM film had an approximate thickness of 5 lm, larger than typical diameters of particles in a regular, noncleanroom environment (< 3 lm). Therefore, even in the presence of such particles on wafers, hydrogel films change their own morphology to enclose the particles and result in particulate tolerances.…”
mentioning
confidence: 99%