1994
DOI: 10.1002/pssa.2211450129
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Hydrogen Incorporation in Sputter-Deposited, In-Chamber Annealed Amorphous Silicon Thin Films. An Infrared and Elastic Recoil Analysis

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Cited by 3 publications
(2 citation statements)
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“…Of the plasma techniques, glow discharge and sputtering, the former has received the most attention probably due to its ability to produce films with superior optical and electrical properties [14] but reactive sputtering deposition has the advantage of permitting good control of the hydrogen content of the amorphous silicon. [15] Since the hydrogen content of a-Si:H has a major effect on the optical and electrical RESEARCH NEWS J. Henry, J. Livingstone/Thin-Film Amorphous Silicon Position-Sensitive Detectors properties, this can be a useful tool for tailoring material properties to a particular use.…”
Section: A-si-based Position-sensitive Detectorsmentioning
confidence: 99%
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“…Of the plasma techniques, glow discharge and sputtering, the former has received the most attention probably due to its ability to produce films with superior optical and electrical properties [14] but reactive sputtering deposition has the advantage of permitting good control of the hydrogen content of the amorphous silicon. [15] Since the hydrogen content of a-Si:H has a major effect on the optical and electrical RESEARCH NEWS J. Henry, J. Livingstone/Thin-Film Amorphous Silicon Position-Sensitive Detectors properties, this can be a useful tool for tailoring material properties to a particular use.…”
Section: A-si-based Position-sensitive Detectorsmentioning
confidence: 99%
“…Our work involves the fabrication of thin-film amorphous silicon and crystalline devices, both of which show promising results. The thin-film silicon work is founded on a long research program studying the characteristics and properties of sputtered amorphous silicon, in particular its hydrogenation [15] and the light-induced Staebler±Wronski effect. Only the thin-film PSDs will be described here.…”
Section: Research Programmentioning
confidence: 99%