1980
DOI: 10.1080/13642818008245406
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Hydrogen profiling in amorphous silicon films and p-n junctions

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1981
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Cited by 50 publications
(5 citation statements)
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“…The remarkable independence of hydrogen content on boron doping in our samples contrasts with previous measurements in a-Si : H by Miiller, Demond, Kalbitzer, Damjantschitsch and Mannsperger (1980). This fact could be due to a lower effective diffusion length for out-diffusion of hydrogen in more void-rich material as compared to more compact material as stated by Beyer et al (1 989).…”
Section: Chemical Composition and Optical Parameterscontrasting
confidence: 83%
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“…The remarkable independence of hydrogen content on boron doping in our samples contrasts with previous measurements in a-Si : H by Miiller, Demond, Kalbitzer, Damjantschitsch and Mannsperger (1980). This fact could be due to a lower effective diffusion length for out-diffusion of hydrogen in more void-rich material as compared to more compact material as stated by Beyer et al (1 989).…”
Section: Chemical Composition and Optical Parameterscontrasting
confidence: 83%
“…2, the correlation between optical gap and Ere, has also not previously been observed in all materials. For example, in pure a-Si : H doped with diborane, Ristein and Weiser (1985) found little variation in Ere, but a large increase in E , (more correctly f",). The latter they attributed to an increase of oscillator strength indicating a change of the covalent network due to a reduction of the average Si-Si bond length with boron doping.…”
Section: Optical Parameters and The Single-oscillator Modelmentioning
confidence: 93%
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“…We observe EL efficiency vaiues ranging up to nEL = 0.1 nrpL , where n' is the effective PL efficiency for excitation light at Argon laser energy of 2.4egf: which has a penetration depth of % 1OOnm. The top (n+) layer in these junctions has negligible PL efficiency and hydrogen profiling data (4) show that it extends to a depth % 50nm. We estimate that the excitation light at 2.4eV is attenuated by a factor of 0.3 on passing through this layer, and this is confirmed by PL experiments on the change in PL efficiency (using i 2.4eV excitation) on etching away the n+ layer.…”
mentioning
confidence: 95%
“…An equally good fit can be obtained for X = 150 2 10nm. Recent hydrogen profiling data on similar junctions (4) she$ that the p+ layer extends to a depth ?. 150nm.…”
mentioning
confidence: 99%