This is a repository copy of The effect of metal-rich growth conditions on the microstructure of ScxGa1-xN films grown using molecular beam epitaxy.White Rose Research Online URL for this paper: http://eprints.whiterose.ac.uk/93558/ Version: Accepted Version
Article:Tsui, H.C.L., Goff, L.E., Barradas, N.P. et al. (7 more authors) (2015) The effect of metal-rich growth conditions on the microstructure of ScxGa1-xN films grown using molecular beam epitaxy. physica status solidi (a), 212 (12). 2837 -2842. ISSN 1862-6300 https://doi.org/10.1002/pssa.201532292 eprints@whiterose.ac.uk https://eprints.whiterose.ac.uk/ Reuse Unless indicated otherwise, fulltext items are protected by copyright with all rights reserved. The copyright exception in section 29 of the Copyright, Designs and Patents Act 1988 allows the making of a single copy solely for the purpose of non-commercial research or private study within the limits of fair dealing. The publisher or other rights-holder may allow further reproduction and re-use of this version -refer to the White Rose Research Online record for this item. Where records identify the publisher as the copyright holder, users can verify any specific terms of use on the publisher's website.
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AbstractEpitaxial ScxGa1-xN films with 0 x 0.50 were grown using molecular beam epitaxy under metal-rich conditions. The ScxGa1-xN growth rate increased with increasing Sc flux despite the use of metal-rich growth conditions, which is attributed to the catalytic decomposition of N2 induced by the presence of Sc. Microstructural analysis showed that phase-pure wurtzite ScxGa1-xN was achieved up to x = 0.26, which is significantly higher than that previously reported for nitrogen-rich conditions, indicating that the use of metalrich conditions can help to stabilise wurtzite phase ScxGa1-xN.Keywords: ScGaN, molecular beam epitaxy, TEM PACS codes: 61.66Dk, 68.55Nq, 81.05Ea, 81.15Hi 1 Introduction Wurtzite-structure III-nitrides are of interest for optoelectronic and high power electronic applications. These semiconductors include AlN, GaN and InN and their alloys, which have direct band gaps of 6.2 eV, 3.4 eV and 0.7 eV respectively [1][2][3][4] and are therefore able to emit light across the ultraviolet, violet and red spectral regions. However, current state-of-the-art optoelectronic devices suffer from poor internal quantum efficiencies, partly due to the lattice mismatch with the substrate or between layers leading to high dislocation densities and in-plane stresses [5]. Therefore, it is of interest to develop new wurtzite-structure nitride semiconductors with different lattice parameter-band gap relationships, such as alloys between GaN and ScN.