Ibc - Ion Beam Center

Abstract

In the Ion Beam Center (IBC), various set-ups -electrostatic accelerators, ion implanters, plasma-based ion implantation equipment, low-energy ion tools, an ion microscope etc. -are combined into a unique facility for research and applications using ion beams. Almost all ions from stable chemical nuclides are available in the ion energy range from 10 eV to about 60 MeV. In addition to broad beams, also focused (down to 1 nm) and highly-charged (charge state up to 45 + ) ion beams, or ions extracted from a plasma can be provided. In total, the IBC operates more than 30 dedicated tools or beamline end-stations. The speci c expertise of IBC is the modi cation and analysis of solids by energetic ions aimed to develop novel materials for information technology, electronics or energy systems. In addition, ion beam analysis techniques became of increasing importance for interdisciplinary elds like geochemistry, climate or environmental research and resources technology. Special add-on services o ered ensure a successful realization of user experiments. Based on a long-term expertise, speci c equipment and common commercial procedures, the IBC is strongly active in the use of ion beam techniques for industrial applications aimed to initiate valuable product innovation.

Site-controlled formation of single Si nanocrystals in a buried SiO2 matrix using ion beam mixing

“…The irradiation was performed using a 200 kV ion implanter (Danfysik Model 1090) at the Ion Beam Center of the Helmholtz-Zentrum Dresden-Rossendorf (HZDR) [37]. The ion beam incident angle was kept at 7° to avoid channeling.…”

Migration Kinetics of Surface Ions in Oxygen‐Deficient Perovskite During Topotactic Transitions

“…The measurements were performed with a collimated 1.7-MeV He + beam of the Rossendorf van de Graff accelerator with a 10-20 nA beam current at a backscattering angle of 170°. [58] STEM Imaging and Analysis: The atomic-resolution STEM study was performed on a probe-corrected FEI Titan 80-200 ChemiSTEM microscope, which was operated at an accelerating voltage of 200 kV. The cross-sectional lamella specimens for the HAADF STEM imaging were prepared using an FEI Helios Nanolab 400s focused ion beam (FIB) system.…”