2005
DOI: 10.1063/1.2084340
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III-nitride integration on ferroelectric materials of lithium niobate by molecular beam epitaxy

Abstract: Demonstration of AlGaN/GaN high-electron-mobility transistors on 100 mm diameter Si(111) by plasma-assisted molecular beam epitaxy Appl. Phys. Lett. 97, 232107 (2010); 10.1063/1.3518717 Effect of the growth temperature and the AlN mole fraction on In incorporation and properties of quaternary IIInitride layers grown by molecular beam epitaxy J. Appl. Phys. 104, 083510 (2008); 10.1063/1.2999564III-nitride growth and characteristics on ferroelectric materials using plasma-assisted molecular beam epitaxy Two-dime… Show more

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Cited by 39 publications
(33 citation statements)
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“…For example, it is possible to grow group III nitrides with spatially varied, absolute polarity control on LN substrates. 2 The dipole orientation can be switched at the nanoscale, bearing a great potential for domain-specific surface chemistry as a route towards the fabrication of nanoscale devices. 3 LN surface charges were found to enable artificial photosynthesis 4 and to drive photocatalytic dye decolorization.…”
mentioning
confidence: 99%
“…For example, it is possible to grow group III nitrides with spatially varied, absolute polarity control on LN substrates. 2 The dipole orientation can be switched at the nanoscale, bearing a great potential for domain-specific surface chemistry as a route towards the fabrication of nanoscale devices. 3 LN surface charges were found to enable artificial photosynthesis 4 and to drive photocatalytic dye decolorization.…”
mentioning
confidence: 99%
“…Growth regimes for nitride heteroepitaxy on LiNbO 3 substrates require further optimization to prevent potential reduction of the oxide substrates and formation of unwanted LiNb 3 O 8 layers at the heterointerface [2]. In this paper we report results of GaN heteroepitaxy on LiNbO 3 substrates with different orientation: z-cut and x-cut.…”
Section: Introduction Epitaxial Growth Of Gan On Linbomentioning
confidence: 96%
“…substrates attracts attention due to potential applications of this heterostructure for monolithic integration of materials with complimentary optical and electronic properties [1,2]. At the same time, studies of GaN deposition on LiNbO 3 are in a mainstream of the quest for alternative substrates for nitride epitaxy.…”
Section: Introduction Epitaxial Growth Of Gan On Linbomentioning
confidence: 99%
“…To overcome this problem LiNbO 3 (LN) has been recently proposed as a new substrate. LN is characterized by a relatively small lattice mismatch with respect to GaN and an outstanding cost-performance ratio [3][4][5]. The (0001) plane of LN has, just like α-Al 2 O 3 , hexagonal symmetry and provides a nominal lattice mismatch of only 6.8% with the GaN (0001) plane, which results in a better GaN crystal quality.…”
Section: Introductionmentioning
confidence: 99%