2018
DOI: 10.1088/1361-6641/aae6a5
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III–V quantum-dot lasers monolithically grown on silicon

Abstract: The monolithic growth of III-V semiconductor lasers on Si remains the 'holy grail' for full-scale deployment of Si photonics with reduced cost and added flexibility. Further, semiconductor lasers with active regions made from quantum dots (QDs) have shown superior device performance over conventional quantum well (QW) counterparts and offer new functionalities. There are other advantages of QDs for monolithic III-V-on-Si integration over QWs, such as QD devices being less sensitive to defects. It is, therefore… Show more

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Cited by 41 publications
(33 citation statements)
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References 130 publications
(212 reference statements)
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“…Although the heterogeneous approach has been intensively studied and sufficiently matured to be commercially adopted by industry, this approach still has limitations, including expensive, smallsized III-V substrates and low integration density [30]. In this regard, the monolithic integration, capable of providing economically efficient mass production and dense integration, has attracted substantial interest recently [31]. Moreover, the defect-tolerable III-V QD lasers have demonstrated the feasibility of direct growth of III-V on Si.…”
Section: Monolithic Integration Of Iii-v Qd Lasers On Simentioning
confidence: 99%
“…Although the heterogeneous approach has been intensively studied and sufficiently matured to be commercially adopted by industry, this approach still has limitations, including expensive, smallsized III-V substrates and low integration density [30]. In this regard, the monolithic integration, capable of providing economically efficient mass production and dense integration, has attracted substantial interest recently [31]. Moreover, the defect-tolerable III-V QD lasers have demonstrated the feasibility of direct growth of III-V on Si.…”
Section: Monolithic Integration Of Iii-v Qd Lasers On Simentioning
confidence: 99%
“…An interesting and intuitive approach is the heteroepitaxy allowing for the monolithic integration via the direct growth of III–V semiconductors on silicon substrates with MBE or MOVPE. This, however, brings several technological challenges: first of all, the high lattice mismatch of 4.2% between Si and GaAs leads to the formation of threading dislocations nucleating at the Si‐GaAs‐interface and propagating through the GaAs layer . The result is an inferior layer quality and surface defects strongly reducing the optical properties, for example, by affecting radiative recombination processes of integrated QDs.…”
Section: Hybrid Quantum Photonic Circuitsmentioning
confidence: 99%
“…After that, a three-step growth method was introduced: a GaAs buffer layer with a thickness of 30, 170 and 800 nm grown at 350 o C, 450 o C and 590 o C, respectively [18], [42]. With these techniques, most of the defects could be well confined in the first 200 nm, although the density of TDs propagating towards the active region was still as high as 1 x 10 9 cm −2 [47]. To further eliminate the TDs, the periodically strained-layer superlattices (SLSs) composed of In 0.18 Ga 0.82 As/GaAs were developed as the dislocation filter layers (DFLs) [48].…”
Section: Qd Lasers On Si Substrate With Offcutmentioning
confidence: 99%