Gallium telluride (GaTe) is a van der Waals semiconductor, currently adopted for photonic and optoelectronic devices. However, the rapid degradation of GaTe in air, promoted by Te vacancies, is detrimental for device applications. Here, it is demonstrate that the surface oxidation of GaTe can be unexpectedly exploited for expanding the breadth of applications of GaTe. Specifically, the formation of a nanoscale sub-stoichiometric wide-band-gap Ga 2 O 3 skin, promoted by Te vacancies, over narrow-band-gap GaTe x upon air exposure is beneficial for electrocatalysis, photocatalysis, and gas sensing . In particular, the Heyrovsky step (H ads + H + + e − → H 2 ) of hydrogen evolution reaction in an acidic medium is barrier-free for the sub-stoichiometric gallium-oxide/ gallium-telluride heterostructure, which also enables a significant reduction of costs with respect to state-of-the-art Pt/C electrodes. In the photocatalytic process, the photo-generated electrons migrate from GaTe to Ga 2 O x skin, which acts as the chemically active side of the interface. Moreover, the Ga 2 O 3 / GaTe heterostructure is a suitable platform for sensing of H 2 O, NH 3 , and NO 2 at operational temperatures extended up to 600 °C (useful for gas detection in combustion processes), mainly due to the increased area of charge redistribution after adsorption achieved upon oxidation of GaTe.