2016
DOI: 10.1364/prj.5.000022
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Image lithography in telluride suboxide thin film through controlling “virtual” bandgap

Abstract: In this work, TeO 0.7 thin films were prepared by the reactive magnetron-controlling sputtering method. Complex gray-scale patterns were successfully fabricated on TeO 0.7 thin films through the laser direct writing method. The structural origin of TeO 0.7 thin film was investigated for gray-scale pattern formation. It is found that multiple gray-scale levels are dependent on the "virtual" bandgap energy of TeO 0.7 thin films. The bandgap energy changes lead to refractive index and reflectivity difference. Thu… Show more

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Cited by 15 publications
(3 citation statements)
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“…The binding energy distinction of Te 3d XPS related to telluroxides could be caused by the formation of mixed phases with different lattice structures. [ 54 ] When discharged to ‐0.2 V, a residual peak of Te (+4) 3d 5/2 XPS is still observed in ZS+ZC/ACN, while it is nearly eliminated in ZS+ZC/ACN/Glu, manifesting that the Glu/Cl − co‐additive boosts the conversion of Te oxide. Based on the discussion above, the oxidative conversion mechanisms of Nano‐Te in ZS+ZC/ACN/Glu and ZS+ZC/ACN are outlined in Figure 4h.…”
Section: Resultsmentioning
confidence: 99%
“…The binding energy distinction of Te 3d XPS related to telluroxides could be caused by the formation of mixed phases with different lattice structures. [ 54 ] When discharged to ‐0.2 V, a residual peak of Te (+4) 3d 5/2 XPS is still observed in ZS+ZC/ACN, while it is nearly eliminated in ZS+ZC/ACN/Glu, manifesting that the Glu/Cl − co‐additive boosts the conversion of Te oxide. Based on the discussion above, the oxidative conversion mechanisms of Nano‐Te in ZS+ZC/ACN/Glu and ZS+ZC/ACN are outlined in Figure 4h.…”
Section: Resultsmentioning
confidence: 99%
“…According to theoretical results, the oxidation process starts at Te vacancies or from Ga 2 Te 3 formed after the decomposition of water-intercalated GaTe (Figures S2 and S3, Supporting Information). After 21 h in air, the surface is passivated with an outermost oxide skin with GaTeO, Ga 2 O 3 , [36] Ga 2 O 3 , Te, and Te oxides (TeO x , TeO 2 , TeO 3 ) [37] (see TEM image in Figure 7f for direct imaging). These oxides further evolved to oxy-hydroxide species, [38] as a consequence of favorable water dissociation at defects on the oxidized surface.…”
Section: Surface Structure and Electronic Band Structure Of Gatementioning
confidence: 99%
“…High-speed imaging is an important function for lithography, microscopy, optical storage information reading, etc. To improve the imaging efficiency, auto-focusing technique is necessary [1][2][3][4][5][6][7][8] . For autofocusing technology, defocusing detection is one of the most relevant factors [9][10][11][12][13][14] .…”
Section: Introductionmentioning
confidence: 99%