Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence

Abstract

Planar laser-induced fluorescence measurements were used to investigate the expansion dynamics of a femtosecond laser-induced plasma. Temporally and spatially resolved measurements were performed to monitor the atoms that were ablated from a silicon target. A dye laser (lambda = 288.16 nm) was used to excite fluorescence signals. The radiation of an off-resonant transition (Si 390.55 nm) was observed at different distances from the target surface. This allowed easy detection of the ablated Si atoms without problems caused by scattered laser light. Abel inversion was applied to obtain the radial distribution of the Si atoms. The atom distribution in the plasma shows some peculiarities, depending on the crater depth.

Femtosecond laser ablation elemental mass spectrometry

“…In the low-pressure, low-irradiance regime (<10 13 W/cm 2 ), the plasma expansion of a ultra-short-pulse-generated plasma can be described over a wide range of different parameters (background gas, pressure, laser energy) by a so-called modified point-blast-model (Arnold, Gruber, & Heitz, 1999;Samek et al, 2003).…”

On the use of laser induced breakdown spectroscopy to characterize the naturally existing crystal in Pakistan and its optical emission spectrum

“…Milan and Laserna [9] observed the silicon ablation using a Nd:YAG laser (532 nm) and reported the electron temperature in the range of 6000-9000 K and the electron number density of the order of 10 18 cm − 3 . Samek et al [10] investigated the spatial and temporal behavior of laser ablation of silicon using a femtosecond (fs) laser; 170-200 fs pulse width. Conde et al [11] studied the effects of the number of laser pulses on the surface roughness and ablation depth of silicon and copper samples.…”

Estimation of confidence intervals for radial emissivity and optimization of data treatment techniques in Abel inversion

“…Emission from most sources (e.g., inductively coupled plasma [1][2][3], microwave induced plasma [4,5], spark and arc discharge [6,7], laser induced plasma [8], etc.) is usually measured laterally and therefore contains contributions from all the plasma radial positions along the line of measurement.…”