Imaging solutions for the 22nm node using 1.35NA

Engelen, André; Mulder, Melchior; Bouchoms, Igor; Hansen, Steve; Bouma, Anita; Ngai, A.K.Y.; Veen, Marieke van; Zimmermann, Jörg

doi:10.1117/12.814155

Cited by 10 publications

(21 citation statements)

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“…In these experiments, the benefit of the manufactured freeform sourceswith their intrinsic constraints as described above -was clearly proven [12][13][14].…”

Section: Manufactured Freeform Source Shapes Fulfill the Requirementsmentioning

confidence: 96%

“…To parameterize a measured source, the model source is fitted to the measured source by a non-linear least squares fit which determines the values for the model parameters with which an optimum match of the modeled source to the measured source can be achieved. The parametric pupil fit model described here is an extension of the parametric pupil models introduced in previous publications [10][11][12]. Table 1 lists the fit parameters of the freeform pupil model.…”

Section: The Freeform Pupil Fit Modelmentioning

confidence: 99%

“…Different DOE based freeform source shapes have been generated, for demonstration of build-to-target capabilities and verification of the predicted benefit of freeform vs. classic source shapes in actual wafer exposure experiments, both for DRAM [12] and SRAM [13][14] applications. In these experiments, the benefit of the manufactured freeform sourceswith their intrinsic constraints as described above -was clearly proven [12][13][14].…”

Section: Manufactured Freeform Source Shapes Fulfill the Requirementsmentioning

confidence: 99%

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Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

et al. 2010

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The application of customized and freeform illumination source shapes is a key enabler for continued shrink using 193 nm water based immersion lithography at the maximum possible NA of 1.35. In this paper we present the capabilities of the DOE based Aerial XP illuminator and the new programmable FlexRay illuminator. Both of these advanced illumination systems support the generation of such arbitrarily shaped illumination sources. We explain how the different parts of the optical column interact in forming the source shape with which the reticle is illuminated. Practical constraints of the systems do not limit the capabilities to utilize the benefit of freeform source shapes vs. classic pupil shapes. Despite a different pupil forming mechanism in the two illuminator types, the resulting pupils are compatible regarding lithographic imaging performance so that processes can be transferred between the two illuminator types. Measured freeform sources can be characterized by applying a parametric fit model, to extract information for optimum pupil setup, and by importing the measured source bitmap into an imaging simulator to directly evaluate its impact on CD and overlay. We compare measured freeform sources from both illuminator types and demonstrate the good matching between measured FlexRay and DOE based freeform source shapes.

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“…In these experiments, the benefit of the manufactured freeform sourceswith their intrinsic constraints as described above -was clearly proven [12][13][14].…”

Section: Manufactured Freeform Source Shapes Fulfill the Requirementsmentioning

confidence: 96%

Section: The Freeform Pupil Fit Modelmentioning

confidence: 99%

Section: Manufactured Freeform Source Shapes Fulfill the Requirementsmentioning

confidence: 99%

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Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

et al. 2010

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“…Figure 6 shows some of the 1st and 2nd order "energetic" shifts. For more details on the pupil fit model we refer to [1,2,3] PFM pupil analysis method has quite more the number of parameters in comparison of the classical pupil analysis method. Therefore, it is possible to describe very closely to the real source pupil of the scanner with PFM method due to many detail parameters.…”

Section: Description and Verification Of The Pupil Fit Modelmentioning

confidence: 99%

“…A new type of pupil analysis method was introduced earlier [1,2,3]. Due to the large number of the newly introduced pupil parameters it is difficult to interpret their importance for the resultant lithography process.…”

Section: Description and Verification Of The Pupil Fit Modelmentioning

confidence: 99%

Analysis of the impact of pupil shape variation by pupil fit modeling

Jeon¹,

Park²,

Yang³

et al. 2010

SPIE Proceedings

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As K1 factor for mass-production of memory devices has been decreased to almost its theoretical limit, the process window of lithography is getting much smaller and the production yield has become more sensitive to even small variations of the process in lithography. So it is necessary to control the process variations more tightly than ever. In mass-production, it is very hard to extend the production capacity if the tool-to-tool variation of scanners and/or scanner stability through time is not minimized. One of the most critical sources of variation is the illumination pupil. So it is critical to qualify the shape of pupils in scanners to control tool-to-tool variations.

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Experimental verification of source-mask optimization and freeform illumination for 22-nm node static random access memory cells

Bekaert

2011

J. Micro/Nanolith. MEMS MOEMS

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Imaging solutions for the 22nm node using 1.35NA

Cited by 10 publications

References 0 publications

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Analysis of the impact of pupil shape variation by pupil fit modeling

Experimental verification of source-mask optimization and freeform illumination for 22-nm node static random access memory cells

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