2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings 2006
DOI: 10.1109/icsict.2006.306132
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Impact of base doping profile on stability characteristics of SiGe HBTs

Abstract: The influence of doping profile on stability characteristics of SiGe HBTs in both common-emitter and common-base configurations is studied for the first time. It is found that the base doping concentration has a strong influence on the stability characteristics of the common-base configuration. An unconditional stability operation condition for the common-base SiGe HBTs can be potentially realized over the entire amplification frequency range by employing sufficiently high base-doping concentrations.

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“…This conclusion does not agree with the analysis in Ref. [6] that for the RFCMOS the source resistance is always helpful to increase the K and improve the device stability. And the stability effect of the transconductance g m is similar to the emitter resistance.…”
Section: Modeling and Discussion Of Stability Factor Kcontrasting
confidence: 90%
“…This conclusion does not agree with the analysis in Ref. [6] that for the RFCMOS the source resistance is always helpful to increase the K and improve the device stability. And the stability effect of the transconductance g m is similar to the emitter resistance.…”
Section: Modeling and Discussion Of Stability Factor Kcontrasting
confidence: 90%