Block copolymers
(BCPs) consist of two or more covalently bound
chemically distinct homopolymer blocks. These macromolecules have
emerging applications in photonics, membrane separations, and nanolithography
stemming from their self-assembly into regular nanoscale structures.
Theory suggests that cyclic BCPs should form features up to 40% smaller
than their linear analogs while also exhibiting superior thin-film
stability and assembly dynamics. However, the complex syntheses required
to produce cyclic polymers mean that a need for pure cyclic BCPs would
present a challenge to large-scale manufacturing. Here, we employ
dissipative particle dynamics simulations to probe the self-assembly
behavior of cyclic/linear BCP blends, focusing on nanofeature size
and interfacial width as these qualities are critical to nanopatterning
applications. We find that for mixtures of symmetric cyclic and linear
polymers with equivalent lengths, up to 10% synthetic impurity has
a minimal impact on cyclic BCP feature dimensions and interfacial
roughness. On the other hand, blending with cyclic BCPs provides a
route to “fine-tune” linear BCP feature sizes. We analyze
simulated blend domain spacings within the context of strong segregation
theory and find significant deviations between simulation and theory
that arise from molecular-level packing motifs not included in theory.
These insights into blend self-assembly will assist experimentalists
in rationally designing BCP materials for advanced nanolithography
applications.