2011
DOI: 10.1116/1.3658380
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Impact of electrode roughness on metal-insulator-metal tunnel diodes with atomic layer deposited Al2O3 tunnel barriers

Abstract: Metal-insulator-metal (MIM) tunnel diodes on a variety of high and low work function metals with various levels of root-mean-square roughness are fabricated using high quality atomic layer deposited Al 2 O 3 as the insulating tunnel barrier. It is found that electrode surface roughness can dominate the current versus voltage characteristics of MIM diodes, even overwhelming the impact of metal work function. Devices with smoother bottom electrodes are found to produce current versus voltage behavior with higher… Show more

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Cited by 62 publications
(45 citation statements)
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“…ZrCuAlNi was suggested as an electrode due to its low roughness after growth, making it suitable for MIM devices 182,183 . However, it is not ideal due to formation of an interfacial compound at the interface with the insulator.…”
Section: Experimental Devicesmentioning
confidence: 99%
“…ZrCuAlNi was suggested as an electrode due to its low roughness after growth, making it suitable for MIM devices 182,183 . However, it is not ideal due to formation of an interfacial compound at the interface with the insulator.…”
Section: Experimental Devicesmentioning
confidence: 99%
“…Structural defects at the interface [3,5], roughness of the metal substrate [4,10,11] and nonuniformity of the oxide thickness [3,7,8] are anticipated to be the critical factors, which may deteriorate the functionality of the oxide as a barrier. However, characterization of this impact is in its early stage and hence still uncertain.…”
Section: Introductionmentioning
confidence: 99%
“…Although the structure of Al/Al 2 O 3 systems has actively been explored over the decades both theoretically [12][13][14][15][16][17][18][19] and * manana.koberidze@aalto.fi experimentally [4,5,9,[20][21][22][23][24], an in-depth understanding of the interface properties is still an ongoing issue. Experimental observations have provided valuable information, for example, about the most probable crystallographic orientation relationship between Al and Al 2 O 3 at the interface [21,23], Al substrate roughness [4,20], the chemical state of the ions [25], oxide thickness distribution [9], bond lengths and coordinations of the atoms [5] at the interface, Al/O ratios for different oxide thicknesses [24], and different oxidation times and temperatures [25].…”
Section: Introductionmentioning
confidence: 99%
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“…These parameters are key issues for the generation of DC power; the higher the sensitivity the higher the DC signals, according to the relationships (1) and (2). The most explored high-frequency rectifiers able to operate up to optical frequencies are based on metal-insulator-metal 27,28 or metalinsulator-insulator-metal tunnel barriers. 29 However, the efficiency of those devices is low because of their poor diode-like behavior.…”
Section: B Diode-like Behavior and DC Power Generationmentioning
confidence: 99%