“…18,28,29 The impact of dose rate, pH, temperature, oxidant or reductant concentration/pressure, bicarbonate and other groundwater constituents, have been assessed. 14,19,25,26,[30][31][32] During the last decade, considerable progress has been made in the use of surface spectroscopy to study thin films, including uranium oxide films under UHV conditions. 18,28,33 Very recently, X-ray Photoelectron Spectroscopy (XPS) and UV Photoelectron Spectroscopy (UPS) were used to study changes in uranium oxide thin films exposed to O 2 , H 2 and H 2 O plasmas.…”