2019
DOI: 10.3390/ma12233972
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Impact of Line Edge Roughness on ReRAM Uniformity and Scaling

Abstract: We investigate the effects of Line Edge Roughness (LER) of electrode lines on the uniformity of Resistive Random Access Memory (ReRAM) device areas in cross-point architectures. To this end, a modeling approach is implemented based on the generation of 2D cross-point patterns with predefined and controlled LER and pattern parameters. The aim is to evaluate the significance of LER in the variability of device areas and their performances and to pinpoint the most critical parameters and conditions. It is found t… Show more

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Cited by 2 publications
(1 citation statement)
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“…This is followed by the addition part of multi-bit multiplication algorithm across the crossbar with significance-related current amplification for different bit positions so that the total summed current corresponds to the correct final product for output. A crossbar multiplier is potentially an area-saving solution because the memristor crossbar can be built on top of the transistor-related layers using a back-end-of-line process (Constantoudis et al, 2019). Therefore, the area can be smaller than that used by the traditional CMOS multiplier.…”
Section: Introductionmentioning
confidence: 99%
“…This is followed by the addition part of multi-bit multiplication algorithm across the crossbar with significance-related current amplification for different bit positions so that the total summed current corresponds to the correct final product for output. A crossbar multiplier is potentially an area-saving solution because the memristor crossbar can be built on top of the transistor-related layers using a back-end-of-line process (Constantoudis et al, 2019). Therefore, the area can be smaller than that used by the traditional CMOS multiplier.…”
Section: Introductionmentioning
confidence: 99%