2021
DOI: 10.1016/j.rinp.2021.104714
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Impact of phonon scattering mechanisms on the performance of silicene nanoribbon field-effect transistors

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Cited by 9 publications
(11 citation statements)
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“…In the FET domain, the key performance indicators for recently described FETs using 2D materials are collated and benchmarked in Table 1 [ 8 , 9 , 10 , 11 , 12 , 13 , 14 ]. Graphene shows a very high field-effect mobility (μFE) of 30,000 cm 2 /Vs, as seen in real device simulations, which far exceeds other materials.…”
Section: Graphene Field-effect Transistorsmentioning
confidence: 99%
“…In the FET domain, the key performance indicators for recently described FETs using 2D materials are collated and benchmarked in Table 1 [ 8 , 9 , 10 , 11 , 12 , 13 , 14 ]. Graphene shows a very high field-effect mobility (μFE) of 30,000 cm 2 /Vs, as seen in real device simulations, which far exceeds other materials.…”
Section: Graphene Field-effect Transistorsmentioning
confidence: 99%
“…Moreover, the band structure and current-voltage characteristics of the SiNR (N A -ASiNRs) FETs can be suitably controlled by varying the nanoribbon width N A [84]. By considering phonon scattering effects, Chuan et al [85] have extended the dimensional scaling properties of silicene FETs up to the non-ballistic limit (figure 4(a)). The width scaling of the band gap and I on /I off reveals that the 7-ASiNR system is well-optimized for nanoelectronic digital switching applications [86] in the ballistic limit.…”
Section: Transport Properties Of Silicenementioning
confidence: 99%
“…Device performance metrics: on-off current ratio (Ion/I off ), subthreshold swing (SS), and drain-induced barrier lowering (DIBL) of silicene-based (7-SiNR) FETs in presence and absence of phonon scattering process. Reproduced from [85]. CC BY 4.0.…”
Section: Transport Properties Of Silicenementioning
confidence: 99%
“…Among the aforementioned techniques, doping is the most commonly employed technique in the semiconductor industry to alter the electronic properties [ 25 ]. Furthermore, the performance of SiNR FETs are sensitive to their device dimensions [ 20 , 26 ]; and it is still a major challenge to precisely control the widths of nanoribbons even for the established graphene monolayers [ 27 ]. Therefore, a uniformly aluminium (Al) doped silicene monolayer was proposed to engineer the bandgap of silicene, producing the AlSi 3 monolayer.…”
Section: Introductionmentioning
confidence: 99%