Transition metal oxides play a very
important role to develop the
memristive crossbar array for nonvolatile memory for storage and logic
operations. However, the development of a high-density memristive
crossbar array for complex applications is restricted due to low device
yield and high device-to-device (D2D) and cycle-to-cycle (C2C) variability
in device switching voltages. Here, we report the fabrication of a
stable, highly scalable, reproducible, Y2O3-based
memristive crossbar array of (15 × 12) on silicon by utilizing
a dual ion beam sputtering system. The fabricated crossbar array exhibits
the intrinsic nonlinear characteristics of the memristive element
by displaying a high endurance (∼7 × 105 cycles),
high current ratio (>200), good retention (∼1.5 × 105 s), high device yield, low device-to-device (D2D) (0.25),
and cycle-to-cycle (C2C) (0.608) variability in the SET/RESET voltages
of the memristive device, which can be further suitable for analog
computation and logic operations.