Impedance study of the electrophoretic deposition of yttrium silicate from a polymeric precursor sol

Schneider, Oliver; Grosse-Brauckmann, Jana; Argirusis, Christos

doi:10.1016/j.jeurceramsoc.2009.07.020

Cited by 5 publications

(4 citation statements)

References 30 publications

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“…In summary, deposit resistance increases by a factor of only 3.7x during suspension-replenish EPD compared to 36x and 29x in conventional and substrate-replenish EPD, respectively. Therefore, it can be concluded that the growth of the iondepletion region and not the deposit growth is the main driver for the increase in deposit resistance during EPD in agreement with recent studies (Argirusis et al, 2006;Stappers et al, 2008;Schneider et al, 2010). This also confirms our hypothesis that the deposit resistance and hence electric field can be maintained nearly constant by hindering the growth of the ion-depletion region via ion replenishment using a novel suspension replenish EPD approach which can help improve EPD yield.…”

Section: Deposit Resistance During Suspensionreplenish Electrophoreti...supporting

confidence: 92%

“…The hypothesis for this justification is that the resistivity of the deposit is higher than that of the suspension, and hence, an increase in deposit thickness leads to an increase in deposit resistance (Sarkar and Nicholson, 1996). However, further studies contradicted this claim by showing that the resistance of the deposit remains the same before and after the deposition, suggesting there must be another factor causing the rise in deposit resistance during EPD (Argirusis et al, 2006;Stappers et al, 2008;Schneider et al, 2010). Further theoretical and experimental studies pointed to the electrochemical consumption of ions on the deposit electrode as the reason for the rise in deposit resistance during EPD (van Tassel and Randall, 2006b;Stappers et al, 2008;Hu et al, 2019).…”

Section: Graphical Abstract 1 Introductionmentioning

confidence: 98%

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Overcoming the rise in local deposit resistance during electrophoretic deposition via suspension replenishing

et al. 2022

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Nanomaterials have unique properties, functionalities, and excellent performance, and as a result have gained significant interest across disciplines and industries. However, currently, there is a lack of techniques that can assemble as-synthesized nanomaterials in a scalable manner. Electrophoretic deposition (EPD) is a promising method for the scalable assembly of colloidally stable nanomaterials into thick films and arrays. In EPD, an electric field is used to assemble charged colloidal particles onto an oppositely charged substrate. However, in constant voltage EPD the deposition rate decreases with increasing deposition time, which has been attributed in part to the fact that the electric field in the suspension decreases with time. This decreasing electric field has been attributed to two probable causes, (i) increased resistance of the particle film and/or (ii) the growth of an ion-depletion region at the substrate. Here, to increase EPD yield and scalability we sought to distinguish between these two effects and found that the growth of the ion-depletion region plays the most significant role in the increase of the deposit resistance. Here, we also demonstrate a method to maintain constant deposit resistance in EPD by periodic replenishing of suspension, thereby improving EPD’s scalability.

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Section: Deposit Resistance During Suspensionreplenish Electrophoreti...supporting

confidence: 92%

Section: Graphical Abstract 1 Introductionmentioning

confidence: 98%

Overcoming the rise in local deposit resistance during electrophoretic deposition via suspension replenishing

et al. 2022

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“…and coatings (protective film on metallic substrates for example [12]) can been obtained. For the last application, EPD has been widely used from aqueous or organic suspensions of oxides, as TiO 2 [13,14], ZnO [15] or Bi 2 O 3 [16].…”

Section: Introductionmentioning

confidence: 99%

Electrophoretic deposition of hybrid film on aluminium 2024 using sol–gel boehmite nanoparticles

Magalhaes

Ansart

Taberna

et al. 2016

Surface and Coatings Technology

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a b s t r a c tThe realisation of organic/inorganic coatings on metal substrates, prepared by sol-gel route and shaped by electrophoretic deposition (EPD), is a new process which has been the subject of only few studies. In the past few years, EPD became a very interesting deposition technique because it showed some important advantages: i) great control of the deposition rate and ii) good coverage of complex shape parts. Both are the main challenges for all kinds of deposition techniques, used in various fields from anti-corrosion to anti-wear. In this work, the electrophoretic deposition was performed in aqueous sol suspension containing sol-gel boehmite nanoparticles (NPs). The influence of the applied voltage and deposition time on the deposit thickness was studied. The effect of the concentration of NPs, added in the precursor sol, on the thickness was also investigated. The deposition was performed at constant voltage between − 1.2 and − 3.5 V during constant deposition time between 10 and 40 min. It is shown that an increase in the applied voltage and deposition time increased the thickness of the deposit film (from 2 to 11 μm), as well as the amount of evolved hydrogen, resulting in a drop of the formed coatings quality (more porous structure). However, increasing the concentration of NPs in the precursor sol, increased the coating thickness and turned out to be also a key parameter to control the thickness. Finally, it was demonstrated that a perfect control of the microstructure and the deposit thickness was achievable, thanks to both EPD parameters and sol properties.

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“…In EPD, charged particles in a stable suspension are deposited on an oppositely charged electrode, which serves as a substrate, due to an electric field between cathode and anode. It is a simple and inexpensive technique making it possible to synthesize a wide range of the ceramic coatings with varying morphologies and chemical compositions [27][28][29][30] . MAO, as an electrochemical technique, is a relatively convenient and effective technique to deposit functional porous coatings on the surfaces of Ti, Al, Zr, Mg, and their alloys.…”

Section: Introductionmentioning

confidence: 99%

Enhanced Photocatalytic Activity in p-NiO Grafted n-TiO2 Porous Coatings

Bassaki

Niazi

Golestani‐Fard

et al. 2015

Journal of Materials Science & Technology

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Impedance study of the electrophoretic deposition of yttrium silicate from a polymeric precursor sol

Cited by 5 publications

References 30 publications

Overcoming the rise in local deposit resistance during electrophoretic deposition via suspension replenishing

Overcoming the rise in local deposit resistance during electrophoretic deposition via suspension replenishing

Electrophoretic deposition of hybrid film on aluminium 2024 using sol–gel boehmite nanoparticles

Enhanced Photocatalytic Activity in p-NiO Grafted n-TiO2 Porous Coatings

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