Implementation of chemically amplified resist on mask technology below 0.6-μm feature using high-acceleration voltage e-beam system

Lee, Il-Ho; Nam, Kyung-Han; Yeon, Kyeong-Mee; Park, Keuntaek; Koo, Sang-Sool; Koo, Young-Mo; Baik, Ki‐Ho

doi:10.1117/12.360240

SPIE Proceedings

1999

DOI: 10.1117/12.360240

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Implementation of chemically amplified resist on mask technology below 0.6-μm feature using high-acceleration voltage e-beam system

Il-Ho Lee¹,

Kyung-Han Nam²,

Kyeong-Mee Yeon³

et al.

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Implementation of chemically amplified resist on mask technology below 0.6-μm feature using high-acceleration voltage e-beam system

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