2019
DOI: 10.1021/acsami.9b17026
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Implementation of Simple but Powerful Trilayer Oxide-Based Artificial Synapses with a Tailored Bio-Synapse-Like Structure

Abstract: The ultimate aim of artificial synaptic devices is to mimic the features of biological synapses as closely as possible, in particular, its ability of self-adjusting the synaptic weight responding to the external stimulus. In this work, memristors, based on trilayer oxides with a stack structure of TiN/TiON/HfO y /HfO x /TiN, are designed to function as the artificial synapses where intrinsically designed oxygen-deficient HfO x layer, less oxygen-deficient HfO y layer, and TiON layer, imitating the correspond… Show more

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Cited by 32 publications
(22 citation statements)
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“…37,38 Interestingly, from this figure, the DSS also exhibits a strong polarization dependence relationship. Herein, according to the empirical model of symmetric STDP, the results can be well fitted with the following Gaussian equation 43…”
Section: Dssmentioning
confidence: 99%
“…37,38 Interestingly, from this figure, the DSS also exhibits a strong polarization dependence relationship. Herein, according to the empirical model of symmetric STDP, the results can be well fitted with the following Gaussian equation 43…”
Section: Dssmentioning
confidence: 99%
“…[139] However, most filamentary-type memristors suffer from the nonlinear and/or asymmetric weight update issues. [140][141][142][143][144] This is associated with the evolution process of the CFs that are basically divided into two stages. Specifically, the formation process is controlled by the drift process in the first stage, i.e., the CFs are forming, whereas when the CFs have formed, the thickening of CFs is controlled by the diffusion process.…”
Section: Linear and Symmetric Weight Updatementioning
confidence: 99%
“…By confining the Ag filament to the atomic scale, current switching characteristics can be observed, much different from that in thicker switching layer likely due to the significantly different atomic kinetics. By inserting a TiNO x buffer layer [158][159][160], oxide memristors exhibit effectively improved reliability and reduced power consumption. AlNO x [161] and SiO x N y [147] have also been used as the function layer in filamentary oxide memristive devices.…”
Section: Other Hybrid Oxidesmentioning
confidence: 99%