Implicit and electrostatic particle-in-cell/Monte Carlo model in two-dimensional and axisymmetric geometry: II. Self-bias voltage effects in capacitively coupled plasmas

Jiang, Wei; Wang, Hongyu; Bi, Zhenhua; Wang, You‐Nian

doi:10.1088/0963-0252/20/3/035013

Cited by 61 publications

(53 citation statements)

References 42 publications

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“…We make use of our implicit Particle‐in‐cell/Monte Carlo collision (PIC/MCC) method (1D3V) to investigate the MAE on a single‐frequency rf source excited and geometrically symmetric CCP. This method has been described in detail and widely tested before . The self‐bias voltage is determined in the simulation in an iterative way to ensure that the net current to the two electrodes per one rf cycle is zero.…”

Section: Pic/mcc Modelmentioning

confidence: 99%

Magnetical asymmetric effect in geometrically and electrically symmetric capacitively coupled plasma

Yang

Zhang

Wang

et al. 2017

Plasma Processes & Polymers

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Magnetical asymmetric effect (MAE) in a geometrically and electrically symmetric capacitively coupled plasma is investigated by a one‐dimensional implicit Particle‐in‐cell/Monte Carlo collision simulation. We applied four types of asymmetric magnetic field parallel to the electrodes and the discharge operates at a single‐frequency rf source of 13.56 MHz and 150 V in argon with the pressure of 30 mTorr. The simulation results show that the asymmetric magnetic field can generate a significant dc self‐bias, which is the result of a particle‐flux balance applied to each electrode. The asymmetric magnetic field with variable gradient can produce controllable asymmetry in the plasma density and ion flux profiles to each electrode, together with a significant change on IEDF shape and width on the powered electrode. It has demonstrated that the MAE is a promising approach to increase the ion flux and still make the ion energy be adjusted in a certain range, that is, independent control of ion flux and energy to the electrode. The results suggest that the MAE can be an effective means to control the plasma properties as an augmentation to conventional measures.

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Section: Pic/mcc Modelmentioning

confidence: 99%

Magnetical asymmetric effect in geometrically and electrically symmetric capacitively coupled plasma

Yang

Zhang

Wang

et al. 2017

Plasma Processes & Polymers

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“…An explicit PIC model is computationally intensive, since it requires to resolve the Debye length and the electron oscillation frequency, which requires much smaller space and time steps, leading to high computational cost. The alternative approach is to use an implicit PIC model, where much larger space and time steps are allowed with reasonable accuracy. Therefore, in this paper, we use a one‐dimensional implicit and electrostatic PIC/MCC method to investigate the operating effect of an external EB in a rf argon discharge.…”

Section: Physical and Numerical Modelmentioning

confidence: 99%

“…The alternative approach is to use an implicit PIC model, where much larger space and time steps are allowed with reasonable accuracy. Therefore, in this paper, we use a one‐dimensional implicit and electrostatic PIC/MCC method to investigate the operating effect of an external EB in a rf argon discharge. Here we have used a direct implicit PIC/MCC simulation code, which has five steps: (1) pre‐pushing the particle velocity from the previous electric field; (2) charge weighting from the positions of all species particles; (3) obtaining the electric field by solving the Poisson equation with direct summation and extrapolation of the charge density; (4) post‐pushing the particle velocity by using the new electric field; and (5) MCC process.…”

Section: Physical and Numerical Modelmentioning

confidence: 99%

“…More specifically, electron impact excitation and ionization from the Ar ground state are accounted for, and elastic collisions of e‐Ar and Ar + ‐Ar are considered. Coulomb collisions are safely neglected, as the ionization degree is never larger than 10 −4 for the maximum plasma density of ∼10 17 m −3 . In this case, the discharge is dominated by the electron/ion‐neutral collisions, therefore in nearly all similar simulations, including this work, Coulomb collision is not considered.…”

Section: Physical and Numerical Modelmentioning

confidence: 99%

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Electron energy probability function modulation with external electron beam in capacitive coupled radio frequency discharges

Zhang

Huang

et al. 2017

Plasma Processes & Polymers

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We investigate the effect of external electron beam injection on plasma kinetics of a radio‐frequency (rf) capacitive argon discharge at a pressure of 100 mTorr. The rf voltage is applied to the one electrode. Monoenergetic electron beam is injected from the other electrode, with a laboratory accessible injection current and energy. The electron beam injected electrode is grounded. A direct‐implicit particle‐in‐cell/Monte‐Carlo method is used to self‐consistently simulate the plasma density, electron temperature, plasma potential, electron energy probability function (EEPF), and the electron and ion fluxes. The presence of the electron beam increases the plasma density, while decreases the electron temperature and the plasma potential. The plasma density can increase by a factor of 5, at the same time the electron temperature can decrease from 3 to 0.5 eV. The reason is that, with the electron injection, there are more low‐energy electrons occupation in the EEPF. The EEPF is sensitive to the beam modulation: even a small beam current of 0.01A can modify the EEPF significantly. This may have crucial importance for plasma processing of polymers and graphene, where low energy treatment is desired. In addition, electron and ion fluxes to the ground electrode, are also significantly modified with increasing flux and decreasing bombardment energy.

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“…Here we use a one-dimensional (1D) direct implicit method, in which the field equations are derived from direct summation and extrapolation of the equations of particle motion. Our method has been described in detail and tested widely before [22]. Generally, the implicit method is numerically stable over the spatial steps, but the spatial steps will limit the spatial resolution.…”

Section: Description Of the Modelmentioning

confidence: 99%

Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors

2014

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In metallized film capacitors, there exists an air gap of about 0.2 μm between the films, with a pressure ranging generally from 1-30 atm. Because of the created potential difference between the two films, a microdischarge is formed in this gap. In this paper, we use an implicit particle-in-cell Monte Carlo collision simulation method to study the discharge properties in this direct-current microdischarge with 0.2 μm gap in a range of different voltages and pressures. The discharge process is significantly different from a conventional high pressure discharge. Indeed, the high electric field due to the small gap sustains the discharge by field emission. At low applied voltage (∼15 V), only the electrons are generated by field emission, while both electrons and ions are generated as a stable glow discharge at medium applied voltage (∼50 V). At still higher applied voltage (∼100 V), the number of electrons and ions rapidly multiplies, the electric field reverses, and the discharge changes from a glow to an arc regime.

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Implicit and electrostatic particle-in-cell/Monte Carlo model in two-dimensional and axisymmetric geometry: II. Self-bias voltage effects in capacitively coupled plasmas

Cited by 61 publications

References 42 publications

Magnetical asymmetric effect in geometrically and electrically symmetric capacitively coupled plasma

Magnetical asymmetric effect in geometrically and electrically symmetric capacitively coupled plasma

Electron energy probability function modulation with external electron beam in capacitive coupled radio frequency discharges

Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors

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