2020
DOI: 10.3390/nano10061024
|View full text |Cite
|
Sign up to set email alerts
|

Improved Field Electron Emission Properties of Phosphorus and Nitrogen Co-Doped Nanocrystalline Diamond Films

Abstract: Nanocrystalline diamond (NCD) field emitters have attracted significant interest for vacuum microelectronics applications. This work presents an approach to enhance the field electron emission (FEE) properties of NCD films by co-doping phosphorus (P) and nitrogen (N) using microwave plasma-enhanced chemical vapor deposition. While the methane (CH4) and P concentrations are kept constant, the N2 concentration is varied from 0.2% to 2% and supplemented by H2. The composition of the gas mixture is tracked in situ… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
10
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
8

Relationship

2
6

Authors

Journals

citations
Cited by 13 publications
(10 citation statements)
references
References 27 publications
(33 reference statements)
0
10
0
Order By: Relevance
“…23 More recent implementations involve in situ Raman spectroscopy during thermal decomposition of a tungsten imido complex by aerosol-assisted (AA)CVD, 24 or in situ optical emission spectroscopy during microwave plasma-enhanced chemical vapor deposition of phosphorus (P) and nitrogen (N) co-doped nanocrystalline diamond. 25 Focusing on analogous studies of CVD processes involving silicon-containing precursors, the majority of the reported 6 literature concerns the binary systems SiC, SiO2 or Si3N4 from chlorosilanes, silanes or TEOS. Among them, Zhang et al 26 used GC-MS for the characterization of the gas phase during the deposition of SiC from methyltrichlorosilane in the presence of H2, identifying HCl and SiCl4 molecules as by-products.…”
mentioning
confidence: 99%
“…23 More recent implementations involve in situ Raman spectroscopy during thermal decomposition of a tungsten imido complex by aerosol-assisted (AA)CVD, 24 or in situ optical emission spectroscopy during microwave plasma-enhanced chemical vapor deposition of phosphorus (P) and nitrogen (N) co-doped nanocrystalline diamond. 25 Focusing on analogous studies of CVD processes involving silicon-containing precursors, the majority of the reported 6 literature concerns the binary systems SiC, SiO2 or Si3N4 from chlorosilanes, silanes or TEOS. Among them, Zhang et al 26 used GC-MS for the characterization of the gas phase during the deposition of SiC from methyltrichlorosilane in the presence of H2, identifying HCl and SiCl4 molecules as by-products.…”
mentioning
confidence: 99%
“…The co-doping of boron and oxygen has been widely investigated by many groups. [13][14][15] For example, Issaoui et al [16] have studied the effect of oxygen on the heavily boron-doped diamond and shown that the obtained films exhibit high crystalline quality with adding a large amount of oxygen in gas phase. However, most of the prior literature focuses on the effect of oxygen on the properties (such as crystalline quality, [17,18] growth rate, [18,19] and electrical property [17,19] ) in heavily boron-doped diamond.…”
Section: Introductionmentioning
confidence: 99%
“…Using suitable dopants and impurities, it is practicable to synthesize electrically conducting diamond films and also the conductivity can be tailored related to the application requirement. 12, 13 Diamond films with micron-sized grains are designated as microcrystalline diamond (MCD) films, which possess high resistivity. 14 By incorporation of nitrogen in CH 4 /H 2 plasma, the grain size reduces from micron to nanosize, ensuing the formation of nanocrystalline diamond (NCD) films.…”
Section: ■ Introductionmentioning
confidence: 99%
“…Along with the abovementioned properties, diamond films should be electrically conducting to be an efficient cathode in microplasma devices. Using suitable dopants and impurities, it is practicable to synthesize electrically conducting diamond films and also the conductivity can be tailored related to the application requirement. , …”
Section: Introductionmentioning
confidence: 99%