2013
DOI: 10.1016/j.jallcom.2012.10.072
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Improved leakage property and reduced crystallization temperature by V2O5 seed layer in K0.4Na0.6NbO3 thin films derived from chemical solution deposition

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Cited by 22 publications
(10 citation statements)
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“…In this regard potassium sodium niobate is considered to be among the most promising materials to replace Pb(Zr,Ti)O 3 , [16,17] which currently dominates the market. The use of Pb(Zr,Ti)O 3 has, however, been restricted in its implementation in electronic devices by the European Union because it contains hazardous lead.…”
mentioning
confidence: 99%
“…In this regard potassium sodium niobate is considered to be among the most promising materials to replace Pb(Zr,Ti)O 3 , [16,17] which currently dominates the market. The use of Pb(Zr,Ti)O 3 has, however, been restricted in its implementation in electronic devices by the European Union because it contains hazardous lead.…”
mentioning
confidence: 99%
“…1). [59] It has been shown that if the crystal structure of the seeding layer is close to that of the ferroelectric oxide, the resulting film grows with a strong preferred orientation. [85] On the contrary, if this seed layer has a non-ferroelectric composition, a decrease of the ferroelectric response (lower P R values and higher coercive fields, E C , than fully crystallized films) should be expected, since it would work like a bottom in-series interface in a planar configuration of capacitors fabricated with the ferroelectric film.…”
Section: Iii6 Seeding Layersmentioning
confidence: 99%
“…1). [11,12,14,39,40,44,46, Fukushima et al, [74] and Budd et al, [75,76] were among the first that demonstrated the successful fabrication of ferroelectric oxide thin films (PbTiO 3 , Pb(Zr,Ti)O 3 , PZT and 2014 [39] 2010 [46] 2019 [40] 2017 [44] 2017 [73] 2015 [72] 2014 [11] 2020 [71] 2011 [63][64][65] 2014 [62] 2008 [68] 2010 [67] 1999 [61] 2020 [70] 2003 [69] 2004 [12] 2000 [66] 2014 [62] 2016 [58] 2008 [57] 2017 [56] 2008 [14] 2001 [60] 2013 [59] 2018 [52] 2003 [53] 2000 [54] 2009 [55] The graphic shows the ferroelectric composition of the film, the processing temperature at which they were processed and the ferroelectric remanent polarization (PR) measured in them. The CSD strategy/ies used for the low-temperature solution processing of the films are also shown.…”
Section: Introductionmentioning
confidence: 99%
“…Limited thickness of KNN‐based films and relatively high sintering temperature make the volatilization of alkali elements inevitable . Additionally, KNN‐based films also suffered from deviation from the composition stoichiometry and high leakage current . Nevertheless, high‐quality KNN‐based films with comparable performances were fabricated after years of research by improving the works of predecessors.…”
Section: Introductionmentioning
confidence: 99%