2019
DOI: 10.3390/mi10070479
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Improved MRD 4H-SiC MESFET with High Power Added Efficiency

Abstract: An improved multi-recessed double-recessed p-buffer layer 4H–SiC metal semiconductor field effect transistor (IMRD 4H-SiC MESFET) with high power added efficiency is proposed and studied by co-simulation of advanced design system (ADS) and technology computer aided design (TCAD) Sentaurus software in this paper. Based on multi-recessed double-recessed p-buffer layer 4H–SiC metal semiconductor field effect transistor (MRD 4H-SiC MESFET), the recessed area of MRD MESFET on both sides of the gate is optimized, th… Show more

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Cited by 15 publications
(5 citation statements)
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“…The 6H-SiC with the wide band gap is a promising material for the application of blue light-emitting diode [3]. The 4H-SiC with high electron mobility is often used as power devices [4,5]. SiC exhibits the abundant structures due to the multiple bonding states (sp, sp 2 , sp 3 ) between carbon and silicon atoms, such as the zero-dimensional nanocages [6], onedimensional (1D) nanotubes, nanorods and nanowires [7][8][9][10][11], two-dimensional (2D) monolayer structures (Tetra-SiC and Penta-SiC 5 monolayer [12,13]) and three-dimensional (3D) crystal structures.…”
Section: Introductionmentioning
confidence: 99%
“…The 6H-SiC with the wide band gap is a promising material for the application of blue light-emitting diode [3]. The 4H-SiC with high electron mobility is often used as power devices [4,5]. SiC exhibits the abundant structures due to the multiple bonding states (sp, sp 2 , sp 3 ) between carbon and silicon atoms, such as the zero-dimensional nanocages [6], onedimensional (1D) nanotubes, nanorods and nanowires [7][8][9][10][11], two-dimensional (2D) monolayer structures (Tetra-SiC and Penta-SiC 5 monolayer [12,13]) and three-dimensional (3D) crystal structures.…”
Section: Introductionmentioning
confidence: 99%
“…Wide bandgap (WBG) semiconductor devices such as GaN high electron mobility transistors (HEMTs) [1], [2], SiC metalsemiconductor field-effect transistors (MESFETs) [3], [4] and recently burgeoning AlN and β-Ga 2 O 3 based ultra-WBG (UWBG) devices [5]- [7] are extremely attractive for highpower and high-frequency electronic applications, due to the high breakdown voltage led by the wide bandgap. However, owing to their superhigh power density, they usually hold very high junction temperatures and the significant overheating within the devices largely restricts their actual performance [8]- [10] and shortens the device lifetime [11].…”
Section: Introductionmentioning
confidence: 99%
“…With the continuous reduction in device size, the requirements of device design for power consumption and efficiency become increasingly higher. In recent years, how to improve the PAE of devices without significantly sacrificing DC and AC characteristics has gradually become an important topic [ 15 , 16 , 17 ].…”
Section: Introductionmentioning
confidence: 99%