2009
DOI: 10.1016/j.surfcoat.2009.03.036
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Improved oxidation resistance of TiAlN coatings by doping with Si or B

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Cited by 94 publications
(36 citation statements)
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“…Even relatively low concentration of Si can inhibit grain growth and stimulate the renucleation of grains in the presence of bias voltage at the substrate during deposition of TiAiN [33] and TiBN coatings [34]. Furthermore, the addition of small amount of Si significantly improves the thermal stability and oxidation resistance of TiAlN coatings [35]. B is known to be an even better choice for the amorphous phase formation and additionally, the incorporation of B into the coating leads to the systematic decrease of mass changes during oxidation processes at high temperatures [18,36].…”
Section: Introductionmentioning
confidence: 99%
“…Even relatively low concentration of Si can inhibit grain growth and stimulate the renucleation of grains in the presence of bias voltage at the substrate during deposition of TiAiN [33] and TiBN coatings [34]. Furthermore, the addition of small amount of Si significantly improves the thermal stability and oxidation resistance of TiAlN coatings [35]. B is known to be an even better choice for the amorphous phase formation and additionally, the incorporation of B into the coating leads to the systematic decrease of mass changes during oxidation processes at high temperatures [18,36].…”
Section: Introductionmentioning
confidence: 99%
“…Figure 7 shows the XRD/SEM/EPMA results of the film after oxidation at 900°C for 30 h. Oxidation at 900°C progressed faster than that at 800°C (Figs. 3,4,5,6). Rutile-TiO 2 , a-Al 2 O 3 , and the SUS304 substrate were detected, along with weak fcc-TiN peaks, owing to the oxidation of most of the film (Fig.…”
Section: Methodsmentioning
confidence: 98%
“…Their oxidation resistance is better than that of the TiN film that oxidizes rapidly above 550°C and comparable to that of AlN film that has high thermal shock resistance [1,2]. TiAlSiN films were developed to improve film performance and have been deposited on steels [3][4][5], Si wafers [6][7][8], WC-Co cemented carbides [9][10][11], and the Ti6Al4V alloy [12] in the form of a monolayer [4][5][6][7][8][9][10]12] or nano-multilayers [11] by magnetron sputtering [4,6,8], arc evaporation [9], or arc ion plating [3,7,11,12]. The films consisted primarily of (TiN ?…”
Section: Introductionmentioning
confidence: 99%
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“…TiAlBN coatings deposited by plasma-assisted twin electron beam (EB) evaporative PVD have shown excellent thermal stability, mechanical properties and field trial results for coated drills when comprised of a nc-(Ti,Al)N/a-BN nanocomposite coating structure [8,9]. Recent results have also shown TiAlBN coatings to exhibit oxidation resistance to temperatures above 800 °C [10].…”
Section: Introductionmentioning
confidence: 99%