A study of the nanostructure and hardness of electron beam evaporated TiAlBN Coatings

Baker, Mark; Monclús, M.A.; Rebholz, Claus; Gibson, P.N.; Leyland, A.; Matthews, A.

doi:10.1016/j.tsf.2009.12.109

Cited by 18 publications

(7 citation statements)

References 28 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…On the other hand, the N 1s peak (Fig. 2b) can be curve fitted into two components attributed to BN and (Ti,Al)N phase at 398.4 and 397.11 eV respectively [7]. The existence of the (Ti,Al)N phase detected through the XPS analysis is in agreement with the shifted diffraction peak during GAXRD analysis.…”

Section: Advanced Materials Research Vol 626supporting

confidence: 72%

“…At B 1s (Fig. 2a), the peak can be curve fitted into two main components attributed to BN and TiB 2 phase at 190.65 and 187.53 eV respectively [7]. Due to high reactivity of boron with oxygen, a small third component corresponding to B 2 O 3 was also added in the B 1s peak.…”

Section: Advanced Materials Research Vol 626mentioning

confidence: 97%

“…The TiAlBN coating had seen to catch many attentions due to its excellent hardness, wear resistance, thermal stability, long-term stability, and drilling performance [3][4][5][6][7][8][9]. The coating can be deposited by various PVD techniques such as electron-beam (EB) evaporation [3,6], and direct current (DC) magnetron sputtering [5,8].…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target

Rosli

Loon

Juoi

et al. 2012

AMR

View full text Add to dashboard Cite

Abstract. TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB 2 amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB 2 nanocomposite. On the other hand, it was found that optimum bias voltage used in present study is -60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at -60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers).

show abstract

Section: Advanced Materials Research Vol 626supporting

confidence: 72%

Section: Advanced Materials Research Vol 626mentioning

confidence: 97%

See 1 more Smart Citation

Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target

Rosli

Loon

Juoi

et al. 2012

AMR

View full text Add to dashboard Cite

show abstract

“…SiC is hard material and at the moh scale it is just below from the diamond. Some other materials like TiAlBN have studied for their structural and hardness properties [5]. Thin films of a-SiC are usually synthesized by glow discharge method and consequently are hydrogenated a-SiC (a-SiC:H) [6].…”

Section: Introductionmentioning

confidence: 99%

Studies of structural and optical properties of sputtered SiC thin films

Mukesh Kumar

2024

Zas Mat

View full text Add to dashboard Cite

The present study explored the deposition of amorphous silicon carbide (a-SiC) thin films on Si (100) and glass substrates using RF-magnetron sputtering. The sputtering power is changed from 100 to 250 W to study its influence on the characteristics of a-SiC thin films. Raman spectroscopy reveals the formation of a-SiC as well as carbon clusters. The film deposited at 100 W clearly shows the presence of both transverse optical (TO) and longitudinal optical (LO) phonon modes. The average roughness of the a-SiC films found to follow an increasing trend with increase in the sputtering power. The optical band gap of the a-SiC films measured by UV-Visible spectrophotometer was found to increase up to 2.45 eV with decrease in sputtering power. All a-SiC thin films were highly transparent. The Photoluminescence (PL) spectroscopy results were in agreement with the data observed by UV-Visible spectroscopy

show abstract

“…TiAlBN coating had catched many attentions due to its superior properties than most studied hard coating such as TiN, TiAlN, and TiBN. TiAlBN coatings presents a nanocomposite feature where nanocrystalline nc-(Ti,Al)N phase are embedded in amorphous a-BN and/or a-TiB 2 phase [1][2][3]. This feature grants the TiAlBN nanocomposite coatings with an excellent hardness, wear resistance, thermal stability, and long-term stability [4,5].…”

mentioning

confidence: 99%

Chemical Composition Analysis of TiAlBN Nanocomposite Coating Deposited via RF Magnetron Sputtering

Rosli

Mahamud

Kwan

et al. 2013

KEM

View full text Add to dashboard Cite

TiAlBN nanocomposite coating have been successfully deposited on AISI 316 substrate via RF magnetron sputtering by varying nitrogen-to-total flow ratio (RN) of 5, 15, 20, 25%, as well as varying substrate temperature of 100, 200, 300, and 400 oC; using single Ti-Al-BN hot-pressed target. Chemical compositions of the coatings were analysed using X-ray photoelectron spectroscopy (XPS). XPS results showed that the TiAlBN nanocomposite coating reaches a nitride saturated state at higher RN(e.g 15, 20, and 25%) and boron concentration was found to be approximately 9 at.%. However, as the concentration of nitrogen decreases at lower RN(5%), boron concentration was found to increase to 16.17 at. %.This is due to the increase of TiB2phase in the coating. Variations of substrate temperatures were found to give no significant effect on the chemical composition of the deposited TiAlBN nanocomposite coating.

show abstract

A study of the nanostructure and hardness of electron beam evaporated TiAlBN Coatings

Cited by 18 publications

References 28 publications

Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target

Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target

Studies of structural and optical properties of sputtered SiC thin films

Chemical Composition Analysis of TiAlBN Nanocomposite Coating Deposited via RF Magnetron Sputtering

Contact Info

Product

Resources

About