We study the formation of the InP on GaAsSb interface grown by molecular beam epitaxy at 450 °C. Using angle resolved x-ray photoemission spectroscopy (XPS), we show that Sb strongly segregates whereas As does not, leading to a Sb-rich InP surface. Similarly, XPS spectra recorded on air-exposed samples reveal oxidized Sb but no oxidized As. We perform a quantitative analysis and determine a Sb segregation coefficient very near to 1. This result is in good agreement with previous reflectance anisotropy spectroscopy observations on the same interface.