2012 IEEE International Meeting for Future of Electron Devices, Kansai 2012
DOI: 10.1109/imfedk.2012.6218598
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Improvement of drain leakage current characteristics in metal-oxide-semiconductor-field-effect-transistor by asymmetric source-drain structure

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Cited by 2 publications
(1 citation statement)
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“…The created 2D anticipated framework is expected to cause an explicit analytical current equation in the subthreshold system. Considering the weak inversion region, the diffusion current is mainly dominated and relative to the electron absorption at the virtual cathode [47]. A GNR FET is a voltage-controlled tunnel barrier device for both the Schottky and doped contacts.…”
Section: Methodsmentioning
confidence: 99%
“…The created 2D anticipated framework is expected to cause an explicit analytical current equation in the subthreshold system. Considering the weak inversion region, the diffusion current is mainly dominated and relative to the electron absorption at the virtual cathode [47]. A GNR FET is a voltage-controlled tunnel barrier device for both the Schottky and doped contacts.…”
Section: Methodsmentioning
confidence: 99%