1997
DOI: 10.1143/jjap.36.935
|View full text |Cite
|
Sign up to set email alerts
|

Improvement of Sensor for Noncontact Capacitance/Voltage Measurement and Lifetime Measurement of Bare Silicon(100)

Abstract: The paper presents experiments and analysis of energy confinement on the CTX spheromak. Compared to previous published results from 0.4 m radius flux conservers, in a 0.67 m radius mesh flux conserver (with the current density kept constant), the magnetic field increases while the plasma density is kept the same. However, the electron temperature does not rise, and hence (fi) yol drops. The plasma resistivity remains constant (the resistance drops as the size increases), and the energy confinement time stays t… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

1998
1998
2016
2016

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(2 citation statements)
references
References 49 publications
0
2
0
Order By: Relevance
“…12,13 The MAOS or MAIS structure is the same as a MOS structure except that the air gap exists between a contactless electrode and a sample wafer. Therefore, we can apply the conventional MOS theory to the contactless electrical techniques.…”
Section: Introductionmentioning
confidence: 99%
“…12,13 The MAOS or MAIS structure is the same as a MOS structure except that the air gap exists between a contactless electrode and a sample wafer. Therefore, we can apply the conventional MOS theory to the contactless electrical techniques.…”
Section: Introductionmentioning
confidence: 99%
“…In this study, the generation lifetime and the surface generation velocity were characterized by combining the Zerbst method with contactless electrical characterization techniques that use a metal-air gap-oxide-semiconductor structure [2][3][4][5] to circumvent the influence of the gate leakage current and the device fabrication process. The contactless Zerbst method can also be used to generate wafer maps of generation lifetime and surface generation velocity by scanning a wafer with a contactless gate electrode.…”
Section: Introductionmentioning
confidence: 99%