In this study, we evaluate the doping concentrations of bare silicon
wafers by noncontact capacitance–voltage (C–V) measurements. The metal-air-insulator-semiconductor (MAIS) method enables the measurement of C–V
characteristics of silicon wafers without oxidation and electrode preparation.
This method has the advantage that a doping profile close to the wafer surface
can be obtained. In our experiment, epitaxial silicon wafers were used to
compare the MAIS method with the conventional MIS method. The
experimental results obtained from the two methods showed good agreement.
Then, doping profiles of boron-doped Czochralski (CZ) wafers were measured
by the MAIS method. The result indicated a significant reduction of the doping
concentration near the wafer surface. This observation is attributed to the
well-known deactivation of boron with atomic hydrogen which permeated the
silicon bulk during the polishing process. This deactivation was recovered by
annealing in air at 180°C for 120 min.