A novel quaternary phosphonium-grafted hierarchically macro-/ mesoporous silica, named as HPS-C-P, was synthesized by alkylating hierarchically porous silica with trimethylchlorosilane and a subsequent twostep radiation-induced grafting of quaternary phosphonium. Fourier transform infrared, X-ray photoelectron spectroscopy (XPS), Brunauer−Emmett−Teller, and scanning electron microscopy analyses testified that alkyl and quaternary phosphonium groups were grafted uniformly in HPS-C-P. The adsorption of HPS-C-P for ReO 4− was evaluated and it was found that the adsorption equilibrium could be achieved within 4 min, and the adsorption isotherm was fitted well by the modified Langmuir model. The maximum ReO 4 − uptake of this adsorbent could reach 140.5 mg•g −1 , which was higher than the quaternary phosphonium-grafted hierarchically porous silica synthesized by a chemical method. HPS-C-P has good radiation resistance and cyclic adsorption performance, and the adsorption selectivity of HPS-C-P toward ReO 4 − in the presence of competitive anions, including NO 3 − , SO 4 2− , Cl − , CO 3 2− , and PO 4 3− , is extremely high, which is higher than most of the adsorbents reported in recent literature studies. Infrared and XPS analysis revealed that ReO 4 − was adsorbed onto HPS-C-P through the ion-exchange mechanism. This work provided a new method to produce highly efficient silica-based adsorbents to selectively remove Re from an aqueous solution even exposed to a radiation environment.