2019
DOI: 10.3103/s1068375519050120
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Improving Spatial Confinement of Anodic Dissolution of Heat-Resistant Chromium−Nickel Alloys during Pulsed Electrochemical Machining

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Cited by 8 publications
(11 citation statements)
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“…With the electrode unit geometry adopted in this work, the linear ambient velocity for the working electrode was ~6 m/s. The experimental setup used was described in detail in work [17].…”
Section: Methodsmentioning
confidence: 99%
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“…With the electrode unit geometry adopted in this work, the linear ambient velocity for the working electrode was ~6 m/s. The experimental setup used was described in detail in work [17].…”
Section: Methodsmentioning
confidence: 99%
“…With ECM being an electrochemical process car-ried out under conditions far away from thermody-namic equilibrium, i.e., at high current densities and high potentials, thermokinetic effects based on the interplay between the rate of an electrochemical process and the surface temperature play an important part in controlling this process [14][15][16]. Studies [7,17] showed the feasibility to control not only processing rates of chromium-nickel steels and alloys under ECM conditions but also their distribution along the surface being processed (with the purpose to improve processing confinement) using pulsed current with pulse duration in the microsecond range. However, the nature of observed effects is still a subject of discussions.…”
Section: Introductionmentioning
confidence: 99%
“…Импульсная ЭХРО имеет свои преимущества, связанные с повышением локализации процесса обработки вследствие наличия возрастающей зависимости выхода по току от плотности тока [2,5,10,13,14]. Такая зависимость имеет место в обработке хромоникелевых сталей в нитратах импульсами микросекундного диапазона длительностей [14,17] (см. также рис.…”
Section: структура пленки и технологические показатели эхроunclassified
“…6 при плотности импульсного тока i p > 1 А/cм 2 ). Однако наличие такой зависимости ограничено использованием определенных значений скважности (не менее s = 4; dc ˂ 25% [17]). Результаты настоящего исследования дают ответ на вопрос о причинах подобных ограничений (рост температуры поверхности за период импульса, см.…”
Section: структура пленки и технологические показатели эхроunclassified
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