Improving stamps for 10 nm level wafer scale nanoimprint lithography

Beck, Marc; Graczyk, Mariusz; Maximov, Ivan; Sarwe, Eva-Lena; Ling, Tgi; Keil, Matthias; Montelius, Lars

doi:10.1016/s0167-9317(02)00464-1

Cited by 268 publications

(131 citation statements)

References 3 publications

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“…grade KAP (Aldrich) in deionized water (Barnsted NANOpure, 18.2 MX cm ±1 ). The solubility data of Solc et al were used for the preparation of KAP solutions and in the calculation of supersaturation [13]. Crystals were indexed with a Stoe 2-circle Model J optical goniometer and a Nonius KappaCCD diffractometer.…”

Section: Methodsmentioning

confidence: 99%

Up‐conversion Luminescence in Dye‐Doped Crystals of Potassium Hydrogen Phthalate

et al. 2003

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can be independently adjusted. Shown in Figure 3e is one example of using a size-reduced nanopillar for nanoimprinting. In this case, the size of nanopillars was reduced using a chromium etchant. The lateral dimension of the imprinted holes was less than 30 nm. Other approaches to size reduction are currently under investigation in our group.In summary, we have developed a low-cost, high-throughput fabrication process for producing large-area, well-ordered periodic nanopillars for nanoimprinting with feature size less than 50 nm that would allow the nanoimprinting technique to be easily accessed without the need for e-beam lithography. When these stamps are used in nanoimprint lithography, large-area periodic nanostructures with lateral dimensions less than 30 nm can be obtained. The size and separation of the fabricated periodic nanostructures can be independently adjusted by selecting different diameters of polystyrene beads in the nanosphere lithography step and by trimming the nanopillars using various size reduction techniques, respectively. The shape of the nanostructures can also be modified by using different combinations of metal masks and etching recipes. ExperimentalNanopillars: To fabricate silicon nanopillars, 1 1 cm 2 substrates cut from ndoped silicon (100) wafers (Gredmann) were used. These silicon substrates were cleaned by immersion in piranha solution (3:1 concentrated H 2 SO 4 / 30 % H 2 O 2 ) and sonication for 30 min. After sonication the substrates were rinsed repeatedly with ultrapure water (18.2 MX, Millipore Simplicity), acetone, and methanol and used immediately. To produce metal masks for the nanopillar array, nanosphere lithography was employed. Details of the nanosphere lithography procedure can be found in the literature [21,22]. In short, monodispersed polystyrene beads of various diameter purchased from Bangs Laboratories, Inc. (Fishers, IN) were diluted in a solution of surfactant Triton X-100 (Aldrich) and methanol (1:400 by volume). This solution was then spin-cast onto substrates to form hexagonally closed-packed 2D colloidal crystals. Depending on the experimental requirements (single or double layer), the speed of spin-coater was varied between 800 and 3600 rpm (~1500 rpm for a double layer), and the dilution ratio of the polystyrene solution was also changed. It was found that the formation of self-assembled 2D colloidal crystals strongly depended on the speed of spin-coater. These 2D colloidal crystals were then used as the deposition templates. A 50 nm thick Cr film was deposited over the polystyrene masks at a rate of 15 nm min ±1 in an ULVAC vapor deposition system at a pressure of 1 10 ±3 Pa. After Cr deposition, the polystyrene beads were removed by sonicating the substrates in CH 2 Cl 2 solution for 3±5 min. To fabricate silicon nanopillar arrays, substrates with metallic masks were placed in a reactive ion etcher (Oxford Plasmalab 80 Plus, 80 W) with a gas mixture of CHF 3 (20 sccm) and O 2 (2 sccm) at a total pressure of 25 mtorr. The nanopillars used for nanoimpri...

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Section: Methodsmentioning

confidence: 99%

Up‐conversion Luminescence in Dye‐Doped Crystals of Potassium Hydrogen Phthalate

et al. 2003

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“…[68] In this respect, the polymer should satisfy the seemingly contradictory requirements of having a low surface energy for easy de-molding whilst maintaining sufficient adhesion to the substrate. Although the mold surface is normally treated with low-surface-energy surfactants, [69] the imprinted polymer still tends to adhere to the mold when imprinting high-density nanoscale structures or high aspect-ratio patterns. Materials that possess dual surface properties are needed to address these critical needs.…”

Section: Siloxane Copolymersmentioning

confidence: 99%

Nanoimprint Lithography: Methods and Material Requirements

2007

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Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.

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“…In addition, a layer of wax that exists on the epidermis of the cicada wing is a low surface tension material [25] and can serve naturally as an anti-sticking coating during the separation process of nanocauliflower arrays. This is in contrast to the cases of artificial templates where the anti-sticking treatment has to be carried out by self-assembling a monolayer of fluorine or methyl-terminated organic molecules to avoid adherence [30,31].…”

Section: Resultsmentioning

confidence: 98%

Fabrication of Organic Solar Cells with Branched Cauliflower-Like Nano Structures as a Back Electrode Replicated from a Natural Template of Cicada Wing Patterns

Nourolahi

Bolorizadeh

Behjat

2017

IJOP

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ABSTRACT-Nanostructures of noble metal materials have been used in organic solar cells for enhancement of performance and light trapping. In this study, we have introduced branched silver cauliflower-like nanopatterns as sub-wavelength structured metal grating in organic solar cells. Self-assembled fabrication process of branched nanopatterns was carried out on a bio-template of cicada wing nanonipple arrays using a gas aggregation dc magnetron sputtering nanocluster source without size filtration. The branched nanostructures provide surface gaps with dimensions near the organic exciton diffusion length, which prevents recombination of charge carriers. An increased power conversion efficiency of 14.8% compared to that of the planar device was achieved mainly due to the enhancement in the short-circuit current density. Besides, these branched cauliflower-like nanopatterns had enhanced optical light absorption in the solar cell as a result of enhancing the optical path length of the reflected light in the active layer and plasmonic effects of the noble metal material.

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Improving stamps for 10 nm level wafer scale nanoimprint lithography

Cited by 268 publications

References 3 publications

Up‐conversion Luminescence in Dye‐Doped Crystals of Potassium Hydrogen Phthalate

Up‐conversion Luminescence in Dye‐Doped Crystals of Potassium Hydrogen Phthalate

Nanoimprint Lithography: Methods and Material Requirements

Fabrication of Organic Solar Cells with Branched Cauliflower-Like Nano Structures as a Back Electrode Replicated from a Natural Template of Cicada Wing Patterns

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