Improving uniformity of atmospheric-pressure dielectric barrier discharges using dual frequency excitation

Liu, Yaoge; Peeters, Floran; Starostin, Sergey A.; Sanden, M.C.M. van de; Vries, H.W. de

doi:10.1088/1361-6595/aaa568

Cited by 17 publications

(30 citation statements)

References 21 publications

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“…A similar electrical behaviour was also observed in the experimental study in Ref. [44] , which is attributed to the fast increase of the capacitive component of the RF current [62] .…”

Section: Voltage-current Waveformssupporting

confidence: 85%

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Numerical simulation of atmospheric-pressure 200 kHz/13.56 MHz dual-frequency dielectric barrier discharges

Liu

Veer

Peeters

et al. 2018

Plasma Sources Sci. Technol.

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A one-dimensional drift-diffusion model is used to study atmospheric-pressure dual frequency (DF) dielectric barrier discharges in argon using the plasma modelling platform PLASIMO. The simulation exhibits an excellent agreement with the experimental results and gives insight into the DF plasma dynamics e.g. the electric field, the sheath edge profiles, the ionization/excitation rate and the electron energy distribution function (EEDF) profiles. The results indicate that due to the RF oscillation, the electric field, the sheath edge and thus the ionization/excitation are temporally modulated. As a result, the plasma conductivity is enhanced as the plasma density is higher. The discharge development is slowed down with a lower current amplitude and a longer duration. The time-averaged sheath is getting thinner with a more pronounced ionization rate and a longer contacting time near the substrate, which could help to improve the efficiency of plasma-assisted surface processing. In addition, the DF excitation exhibits a capability of modifying the EEDF profiles and controlling the plasma chemical kinetics, which can be applied to the other relevant fields e.g. gas phase chemical conversion.

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“…A similar electrical behaviour was also observed in the experimental study in Ref. [44] , which is attributed to the fast increase of the capacitive component of the RF current [62] .…”

Section: Voltage-current Waveformssupporting

confidence: 85%

“…The detailed description of the experimental setup for the atmospheric-pressure DF discharge has been given elsewhere [44,45] . Here only the main parameters of the system are briefly introduced.…”

Section: Methodsmentioning

confidence: 99%

Numerical simulation of atmospheric-pressure 200 kHz/13.56 MHz dual-frequency dielectric barrier discharges

Liu

Veer

Peeters

et al. 2018

Plasma Sources Sci. Technol.

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“…The answer is that while i plasma (t) always remains greater than zero during 'plasma off' phases, it is negligibly small compared to the large plasma currents occurring during 'plasma on' phases. The tendency for Q-V diagrams to become more elliptical, especially with increasing power can, however, be observed as small increases to the 'plasma off' gradient [24,44,45]. This apparent increase in the C cell capacitance can be attributed to the formation of plasma sheaths between the weak residual plasma in the centre of the gas gap and the surrounding surfaces, which can be treated as a small (and likely timedependent) additional capacitance parallel to C gap in the equivalent circuit.…”

Section: Elliptical Q-v Diagramsmentioning

confidence: 98%

Electrical Diagnostics of Dielectric Barrier Discharges

Peeters¹,

Butterworth²

2019

Atmospheric Pressure Plasma - From Diagnostics to Applications

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Atmospheric pressure dielectric barrier discharges (DBD) has many industrial applications and remains a focus of academic research. This chapter provides a thorough overview of electrical diagnostics for DBD, with a specific focus on charge-voltage measurement techniques. These methods are often underutilised in the existing scientific literature, despite the fact that they can provide useful insights into plasma behaviour. Both optimization of the electrical measurement setup and the interpretation of results are treated in-depth. The diagnostic techniques are discussed for a range of applications, from classic planar DBDs, to catalyst packed beds, plasma actuators, as well as techniques for measuring single microdischarges.

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“…In addition, as previously discussed in Ref. [20], due to the periodic oscillation of the RF electric field, the discharge development is slowed down with a lower amplitude and a longer duration of the LF discharge current. The discharge uniformity therefore is significantly improved as the filament is almost invisible even in the boundary areas, see Figure. As previously introduced, to enhance the deposition rate and thus the throughput of the thin films, a higher plasma power density is required.…”

Section: Discharge Emissionmentioning

confidence: 52%

“…The RF electric field facilitates improved stability and uniformity of AP-DBDs simultaneously allowing a higher input power. This makes the DF excitation a potential approach to achieve a higher efficiency of the AP-PECVD process [20,21].…”

Section: Introductionmentioning

confidence: 99%

Atmospheric-pressure silica-like thin film deposition using 200 kHz/13.56 MHz dual frequency excitation

Liu¹,

Elam²,

Zoethout³

et al. 2019

J. Phys. D: Appl. Phys.

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Atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) was used to synthesize silica-like thin films on polyethylene 2, 6 naphthalate (PEN) substrate with hexamethyldisiloxane (HMDSO) as the precursor and Ar/O2/N2 mixture as the working gas. A dual frequency (DF) excitation consisting of 200 kHz and 13.56 MHz frequencies was employed as the plasma source. The results have shown that compared to the single LF discharges, the DF excitation helps to improve plasma uniformity with less filaments. This could help to reduce the macro-defects and therefore to improve the permeation performance of the barriers. Besides, due to the increased electron density and gas temperature, the DF excitation demonstrates a more efficient breaking of Si-CH3 bonds and therefore more oxidized structures of the deposited silica-like thin films.

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Improving uniformity of atmospheric-pressure dielectric barrier discharges using dual frequency excitation

Cited by 17 publications

References 21 publications

Numerical simulation of atmospheric-pressure 200 kHz/13.56 MHz dual-frequency dielectric barrier discharges

Numerical simulation of atmospheric-pressure 200 kHz/13.56 MHz dual-frequency dielectric barrier discharges

Electrical Diagnostics of Dielectric Barrier Discharges

Atmospheric-pressure silica-like thin film deposition using 200 kHz/13.56 MHz dual frequency excitation

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