1999
DOI: 10.1016/s0042-207x(98)00408-4
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Impulse irradiation plasma technology for film deposition

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Cited by 49 publications
(28 citation statements)
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“…19,113,[131][132][133][134] An electric circuit diagram illustrating a pulse generator with a preionizer is shown in Fig. 6.…”
Section: Pulse Generatormentioning
confidence: 99%
See 1 more Smart Citation
“…19,113,[131][132][133][134] An electric circuit diagram illustrating a pulse generator with a preionizer is shown in Fig. 6.…”
Section: Pulse Generatormentioning
confidence: 99%
“…Bohlmark et al 168 report that for a Ti target a significant fraction of the ion flux is the Ti 2þ ion and an observation of the Ti 4þ ion has been reported. 134,186 Poolcharuansin et al 133 claim that there is an increase in multiply charged ions with decreasing operating pressure, in particular in the low pressure regime below 0.5 Pa.…”
Section: B Ion Flux Energy and Compositionmentioning
confidence: 99%
“…There have been several publications on high power pulsed glow and magnetron discharges in the 1990s [13][14][15], though the field of HIPIMS took off only after the seminal paper by Kouznetsov et al [1], as evident by the many publications since, and the introduction of first industrial applications.…”
Section: Operation Of a Magnetron With High Power Pulses 31 A Brief mentioning
confidence: 99%
“…Ionization could, basically, be increased by increasing the power density to the target and thereby increase the plasma density and ionize more of the sputtered material, but this would also lead to target melting, or the need for extreme cooling. The idea to instead apply very short high-power pulses to the target was investigated by several groups of researchers during the 1990s, 54,55,56 but the final breakthrough came with the paper by Kouznetsov et al, published in 1999. 57 By applying short pulses, typically 5-200 μs, with frequencies ranging from tens of Hz to several kHz and power densities in the kW/cm 2 -regime, dense and highly ionized plasma is generated in front of the target.…”
Section: High Power Impulse Magnetron Sputtering -Hipimsmentioning
confidence: 99%