In house designed magnetron sputtering source: Effect of power and annealing on structural, optical and magnetic properties of NiFe2−Lu O4 (x = 0, 0.075) thin films

Ugendar, Kodam; Baby, K. B. Anoop; Markandeyulu, G.

doi:10.1016/j.tsf.2018.07.031

Cited by 5 publications

(5 citation statements)

References 21 publications

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“…The low power resulted in a low density due to the small sputtering yield [27]. By increasing the sputtering power, the Fe films densified, but excessive sputtering power led to coarse grains and uneven distribution, which resulted in high defects [43]. In order to further explain the effect of the sputtering power on Fe films, the particle size (Figure 6a) and size distribution (Figure 5g-l) must be In comparing the Ms of the Fe films deposited at different sputtering powers, it was observed that there is no obvious linear relationship between them.…”

Section: Magnetic Propertiesmentioning

confidence: 99%

“…At the same time, Ms also had obvious advantages compared to the films prepared by other preparation methods, as shown in resulted in a low density due to the small sputtering yield [27]. By increasing the sputtering power, the Fe films densified, but excessive sputtering power led to coarse grains and uneven distribution, which resulted in high defects [43]. In order to further explain the effect of the sputtering power on Fe films, the particle size (Figure 6a) and size distribution (Figure 5g-l) must be mentioned again.…”

Section: Magnetic Propertiesmentioning

confidence: 99%

“…Though the thickness of the Fe film increased at a high power, the density of the film decreased due to the uneven distribution of coarse grains and defects. Therefore, the sputtering power greatly affected the saturation magnetization of the film [43]. Figure 7c is the Hc of Fe films with different sputtering powers.…”

Section: Magnetic Propertiesmentioning

confidence: 99%

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Effect of the Sputtering Power on the Structure, Morphology and Magnetic Properties of Fe Films

Zhou

Wei

et al. 2020

Metals

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In this paper, the radio frequency (RF) magnetron sputtering (MS) method was utilized to fabricate multiple sets of the iron film samples under different sputtering powers. With the help of X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and vibrating sample magnetometer (VSM), how the sputtering power affected the structure, morphology and magnetic properties of the iron film was studied. XRD results showed that all Fe films have a polycrystalline bcc structure and (110) preferred orientation. According to the Bragg equation calculation, the larger the sputtering power, the larger the average grain size, which is consistent with the results of AFM particle size analysis. The main reason is that the sputtering power affects the grain growth mode. As the sputtering power increases, it gradually changes from a small island-like growth to a thick columnar growth. However, from the surface morphology and height profile, we saw that the iron film deposited under 230 W had the most uniform grain size distribution and the grain size was relatively small. This is why thin films deposited under this condition have the best soft magnetic properties. The saturation magnetization (Ms) reaches 1566 emu/cm3, coercivity (Hc) is 112 Oe, and squareness ratio (Mr/Ms) is 0.40. Therefore, iron film prepared under 230 W has good comprehensive properties (highest Ms, lower Hc and Mr/Ms) that provide an experimental basis for further thin film research work.

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Section: Magnetic Propertiesmentioning

confidence: 99%

Section: Magnetic Propertiesmentioning

confidence: 99%

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Effect of the Sputtering Power on the Structure, Morphology and Magnetic Properties of Fe Films

Zhou

Wei

et al. 2020

Metals

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“…After purging the system with Ar gas, the discharge power was supplied to the target, initiating the formation of plasma. Since it is a magnetron sputtering system, a powerful magnetic field is generated using a strong magnet, one pole of which is placed along the central axis of the target and the other in the form of a ring along the edges of the target to confine the secondary electron motion around the target [ 15 ]. These constrained electrons attract a greater number of inert gas ions to be attracted towards the target at a higher kinetic energy, thereby resulting in an increased rate of ion (Ar + ) bombardments with the target, in turn ejecting a greater number of Au atoms [ 16 ].…”

Section: Methodsmentioning

confidence: 99%

Production of Size-Controlled Gold Nanoclusters for Vapor–Liquid–Solid Method

et al. 2022

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This study demonstrated the deposition of size-controlled gold (Au) nanoclusters via direct-current magnetron sputtering and inert gas condensation techniques. The impact of different source parameters, namely, sputtering discharge power, inert gas flow rate, and aggregation length on Au nanoclusters’ size and yield was investigated. Au nanoclusters’ size and size uniformity were confirmed via transmission electron microscopy. In general, Au nanoclusters’ average diameter increased by increasing all source parameters, producing monodispersed nanoclusters of an average size range of 1.7 ± 0.1 nm to 9.1 ± 0.1 nm. Among all source parameters, inert gas flow rate exhibited a strong impact on nanoclusters’ average size, while sputtering discharge power showed great influence on Au nanoclusters’ yield. Results suggest that Au nanoclusters nucleate via a three-body collision mechanism and grow through a two-body collision mechanism, wherein the nanocluster embryos grow in size due to atomic condensation. Ultimately, the usefulness of the produced Au nanoclusters as catalysts for a vapor–liquid–solid technique was put to test to synthesize the phase change material germanium telluride nanowires.

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“…For further exploration, RF sputtering was employed to apply films of Ni0.2Cu0.2Zn0.6Fe2O4 onto Si substrates. Typically, growth-related parameters, including substrate temperature, pressure during sputtering, gas type, and sputtering power, have been acknowledged as influential factors in magnetic property modulation [23][24][25][26][27].…”

Section: Introductionmentioning

confidence: 99%

Study on Crystallinity and Magnetic Properties of NiCuZn Ferrite Films Deposited by RF Sputtering

Zhou,

2024

J. Phys.: Conf. Ser.

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Nickel-zinc ferrite proves to be the top-performing material in terms of soft magnetic features for high-frequency applications. The purpose of this study is to explore the impact of various factors such as sputtering pressure, substrate temperature, sputtering power, and sputtering gas, on the magnetic and structural properties of NiCuZn ferrite thin films. In this research, radio-frequency magnetron sputtering of NiCuZn ferrite thin films on silicon substrates was used to investigate the matter. The study demonstrates that reducing sputtering pressure enhances the crystallization of NiCuZn ferrite films and improves their magnetic properties. The saturation magnetization and crystallinity of the thin films initially increased, then decreased as substrate temperature and sputtering power increased. Furthermore, the sputtered films exhibited higher crystallinity and saturation magnetization in a pure Ar atmosphere compared to an oxygen-containing environment. In this study, we optimized the sputtering parameters to achieve a maximum saturation magnetization strength of 253 emu/cc.

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In house designed magnetron sputtering source: Effect of power and annealing on structural, optical and magnetic properties of NiFe2−Lu O4 (x = 0, 0.075) thin films

Cited by 5 publications

References 21 publications

Effect of the Sputtering Power on the Structure, Morphology and Magnetic Properties of Fe Films

Effect of the Sputtering Power on the Structure, Morphology and Magnetic Properties of Fe Films

Production of Size-Controlled Gold Nanoclusters for Vapor–Liquid–Solid Method

Study on Crystallinity and Magnetic Properties of NiCuZn Ferrite Films Deposited by RF Sputtering

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In house designed magnetron sputtering source: Effect of power and annealing on structural, optical and magnetic properties of NiFe2−Lu O4 (x = 0, 0.075) thin films

Cited by 5 publications

References 21 publications

Effect of the Sputtering Power on the Structure, Morphology and Magnetic Properties of Fe Films

Effect of the Sputtering Power on the Structure, Morphology and Magnetic Properties of Fe Films

Production of Size-Controlled Gold Nanoclusters for Vapor–Liquid–Solid Method

Study on Crystallinity and Magnetic Properties of NiCuZn Ferrite Films Deposited by RF Sputtering

Contact Info

Product

Resources

About

In house designed magnetron sputtering source: Effect of power and annealing on structural, optical and magnetic properties of NiFe2−Lu O4 (x = 0, 0.075) thin films