In-situ mass-spectrometer of magnetized plasmas

Sorokin, I. A.; Визгалов, И. В.; Kurnaev, V. A.; Brandt, C.; Kreter, A.; Linsmeier, Ch.

doi:10.1016/j.nme.2017.01.015

Cited by 7 publications

(10 citation statements)

References 12 publications

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“…Remarkably, unstable triatomic molecular ions H + 3 , D + 3 , are present on the measured spectra. Similar results were obtained in PSI-2 [19], where in-situ measurements were carried out with pure deuterium plasma at similar plasma parameters. As the partial pressure of the impurity increases, the concentrations of the ion flux components gradually change towards an increase in the molecular component at the described plasma parameters.…”

Section: Incident Ion Flux Composition Measurementsupporting

confidence: 84%

A new compact linear beam-plasma discharge simulator BPD-PSI

2022

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A new BPD-PSI line-type plasma simulator is introduced. The device features two vacuum units: a target unit and an electron gun unit, connected to each other by a water-cooled electron beam transport channel. The Pierce-type electron gun is used to generate stationary or pulsed electron beam, utilized for beam-plasma discharge generation. The plasma electron density can be varied in the range of n e = 1 × 1016 - 1 × 1018 m-3 with electron temperature in the range of T e = 1-20 eV. The ion flux of 1 × 1021 m-2 s-1 and heat fluxes up to 5 MW m-2 are obtained. A set of utilized plasma and plasma-surface interaction diagnostics are described. Five demonstration experiments are presented: 1) high vs low power beam-plasma operation, 2) beam-plasma discharge with/without presence of an external magnetic field, 3) incident ion flux composition analysis, 4) incident ion energy distribution function measurement, 5) in-situ target surface temperature control and in-vacuo thermal desorption spectroscopy measurement. All of the technical features of the setup described in this paper make it a new tool for studying plasma-surface interactions.

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Section: Incident Ion Flux Composition Measurementsupporting

confidence: 84%

A new compact linear beam-plasma discharge simulator BPD-PSI

2022

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“…Secondary electron emission (SEE) from solid materials has attracted a lot of attention due to its widespread applications in many technology fields such as night vision, microscopic analysis, satellite navigation, mass spectrum, and space exploration [1,2,3,4,5], and SEE usually plays a role of signal amplification in these applications. But in some cases, SEE may produce a negative effect on the normal operations of some special instruments or equipments.…”

Section: Introductionmentioning

confidence: 99%

Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films

et al. 2019

Materials

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For special instruments or equipments including particle accelerators, space microwave devices and spacecrafts, the suppression for electron-induced secondary electron emission (SEE) occurring on the component surfaces is of great significance due to a negative influence caused by SEE on their normal operations. In this paper, amorphous carbon (a-C) films were prepared on stainless-steel substrates by radio frequency magnetron sputtering, and the effects of substrate temperature (Ts) and continuous electron bombardment on the microstructure and secondary electron emission yield (SEY) of a-C film were investigated in order to achieve a better inhibition for SEE. The experimental results show that a rise of Ts during the a-C film preparation is conducive to a SEY reduction and an increase of multipactor threshold due to the increases of surface roughness and sp2 bond content. In addition, although the SEY of a-C film has a slight increase with the rise of electron bombardment time, the a-C film sample with a lower SEY keeps its lower SEY all the time during continuous electron bombardment. The a-C film prepared at Ts of 500 °C has the lowest SEY peak value of 1.09 with a reduction of 30.6% in comparison with the stainless-steel substrate.

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“…The effectivity of industrial plasma processing devices strongly depends on the plasma parameters such as electron and ion densities, electron temperature, plasma potential, and ion composition. The latter has a crucial impact on the processing result since many of the plasma-surface modification procedures require certain amounts of species bombarding the substrate [1][2][3]. Many types of diagnostics are used in controlling plasma material processing, such as neutral gas composition measurements, optical diagnostic methods, Langmuir probes [4].…”

Section: Introductionmentioning

confidence: 99%

“…Optical methods of plasma diagnostics have certain advantages: they are non-intrusive and relatively easy to implement in almost any conditions. However, they also have several major drawbacks such as low sensitivity to ionic (especially multiply ionized) spectral lines [3], the complexity of the interpretation of molecular lines and, what is most important, inability to obtain quantitative characteristics of the plasma composition [5].…”

Section: Introductionmentioning

confidence: 99%

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Diagnostics of ion fluxes in low-temperature laboratory and industrial plasmas

et al. 2019

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A: We studied the ion fluxes on metal surfaces in the inductively coupled plasma reactor as a test facility. The gas mixture of argon and nitrogen was used, with 0.44 Pa total pressure. The radiofrequency power was varied in a wide range (250-2000 W). The ion fluxes were sampled in situ using a specially designed electrostatic extractor and then analyzed with a custom-built magnetic sector mass-separator. The gas composition was independently monitored by the quadrupole analyzer. All measurements were accompanied by optical emission spectroscopy (OES). The correlations of measured optical and corpuscular data are discussed. The conversion function linking optical and corpuscular intensities for Ar/N 2 radiofrequency discharge was determined.

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In-situ mass-spectrometer of magnetized plasmas

Cited by 7 publications

References 12 publications

A new compact linear beam-plasma discharge simulator BPD-PSI

A new compact linear beam-plasma discharge simulator BPD-PSI

Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films

Diagnostics of ion fluxes in low-temperature laboratory and industrial plasmas

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