2002
DOI: 10.1016/s0169-4332(01)00744-9
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In situ measurements of As/P exchange during InAs/InP(0 0 1) quantum wires growth

Abstract: Unintentional As/P exchange has a significant influence on InAs/InP nanostructures growth. In this paper we report on the As/P exchange reactions at different temperatures studied by in situ stress measurements and reflectance difference characterization. When arsenic atoms incorporate at the InP surface an asymmetric stress is built-up that is responsible for quantum wires formation. We obtain that arsenic atoms do not actively displace phosphorous from the surface at the range of surface temperatures and exp… Show more

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Cited by 22 publications
(25 citation statements)
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“…1-3 However, these nanostructures have not been as extensively exploited as InAs/ GaAs QD partly due to the intrinsic peculiarities of the interface between III-V A / III-V B compounds: On one hand, an asymmetric stress appears at the InAs/ InP interface; 4 on the other hand, complicated V A /V B exchange processes take place during epitaxial growth. Although P / As exchange has been widely studied, [5][6][7][8][9][10][11][12][13][14][15] a deeper understanding of this process is still needed since it determines the size of the nanostructures, governing their emission wavelength.…”
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confidence: 99%
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“…1-3 However, these nanostructures have not been as extensively exploited as InAs/ GaAs QD partly due to the intrinsic peculiarities of the interface between III-V A / III-V B compounds: On one hand, an asymmetric stress appears at the InAs/ InP interface; 4 on the other hand, complicated V A /V B exchange processes take place during epitaxial growth. Although P / As exchange has been widely studied, [5][6][7][8][9][10][11][12][13][14][15] a deeper understanding of this process is still needed since it determines the size of the nanostructures, governing their emission wavelength.…”
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confidence: 99%
“…4 We have used thinned ͑175 m͒ InAs substrates, elongated along the [110] axis to detect stress variations in this direction, in which the whole amount of incorporated InP can be quantified. 5 The phosphorous and arsenic beam equivalent pressures (BEPs) used in these experiments were BEP͑P 2 ͒ = 2.37ϫ 10 −5 mbar and BEP͑As 4 ͒ = 0.53ϫ 10 −5 mbar. Simultaneous reflectance difference measurements and reflection high-energy electron diffraction (RHEED) observations at different T s have also been carried out to determine the reconstructions of the InAs surface 16 and its evolution when arsenic cell is closed.…”
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“…So, stress driven processes must play an important role in the formation of excess of InAs. [13][14][15][16][17] Accordingly, we propose that InAs grows faster at the low strained areas of the surface, process that involves In migration and As/P exchange. In order to prove this assumption, we have measured ⌺ evolution in similar experiments but exposing the InP surface only to As 4 flux at 515°C.…”
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confidence: 99%
“…Before opening the In cell, the P and As cell are switched producing an InAs wetting layer ͓thicknessϷ 1 monolayer͑ML͔͒ due to As/P exchange on the surface at a substrate temperature T S = 515°C. 11 The InAs layer deposition was done at T S = 525°C through a pulsed mode where In and As cells are alternated. In each growth cycle, the In cell was opened during 1 s at an equivalent InAs growth rate of 0.1 ML/s, and the As cell during 0.6 s at a BEP͑As 4 ͒ of 6.4ϫ 10 −6 mbar.…”
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confidence: 99%