2021
DOI: 10.1021/acsphotonics.1c00118
|View full text |Cite
|
Sign up to set email alerts
|

In Situ Patterning Perovskite Quantum Dots by Direct Laser Writing Fabrication

Abstract: Perovskite quantum dots have been attractive building blocks for novel photonic devices development, where patterning is usually one of the most critical steps. We report on the combination of in situ fabrication and direct laser writing based on a 405 nm nanosecond laser, which provides an efficient and simple scheme for patterning perovskite quantum dots during the formation process. The as-fabricated gamma phase CsPbI3 quantum dots patterns show bright photoluminescence emission with a quantum yield up to 9… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
88
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 72 publications
(88 citation statements)
references
References 47 publications
0
88
0
Order By: Relevance
“…Reproduced with permission. [ 395 ] Copyright 2021, American Chemical Society. m) 2D MAPbI 3 flat lens.…”
Section: Integration Fabrication Techniquesmentioning
confidence: 99%
See 2 more Smart Citations
“…Reproduced with permission. [ 395 ] Copyright 2021, American Chemical Society. m) 2D MAPbI 3 flat lens.…”
Section: Integration Fabrication Techniquesmentioning
confidence: 99%
“…Recently, DLW has been used in the fabrication of MXene and 2D perovskite patterns. [ 394–396 ] Figure 5k shows a microcircuit fabricated from MXenes, as a supercapacitor. [ 394 ] In situ patterning of γ‐CsPbI 3 quantum dot‐based films (Figure 5l) was also achieved, [ 395 ] which exhibited bright red PL with a high quantum yield of up to 92%.…”
Section: Integration Fabrication Techniquesmentioning
confidence: 99%
See 1 more Smart Citation
“…Recently, DLW has been used in the fabrication of MXene and 2D perovskite patterns. [381][382][383] Fig. 5(k) shows a microcircuit fabricated from MXenes, as a supercapacitor.…”
Section: (J)mentioning
confidence: 99%
“…[25,26] Therefore, it is a major challenge to prepare micro-PeLEDs with dimensions down to several tens micrometers, together with uniform and intense luminescence. [27] For micro-PeLED displays, a large number of single PeLED pixels are required to form pixel arrays. Inkjet printing (IJP) technology is considered the first choice to prepare single-and self-luminous PeLED pixels, which also promises large-area production.…”
Section: Introductionmentioning
confidence: 99%