In-Situ self-encapsulated flexible multi-layered poly (imide siloxane) copolymer film with resistance to atomic oxygen

Li, Liaoliao; Liu, Changwei; Qu, Chengtun; Zheng, Shuai; Wang, Dezhi; Chang, Jiaying; Zhao, Daoxiang; Tang, Yao; Fan, Xiaodong; Liu, Zhongliang; Xiao, Wanbao

doi:10.1016/j.mtcomm.2020.100959

Cited by 4 publications

(3 citation statements)

References 27 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The mechanical properties of PI-A films are displayed in Figure , and all PI-A films exhibited excellent mechanical properties, with tensile strength ranging from 163 to 202 MPa, initial moduli ranging from 2.4 to 4.4 GPa, and elongations at break ranging from 8 to 12%. The tensile strength and initial modulus of PI-A films with low-level content of AHMA are superior to other PI and PI-based composite films ,− (Figure a). The introduction of AHMA units enhanced the flexibility of the molecular chains, leading to an increased elongation at break and a decreased initial modulus.…”

Section: Resultsmentioning

confidence: 93%

Intrinsically UV-Resistant Copolyimide: Exploring the Impact of UV-Absorbing Groups on Degradation and Comprehensive Performance

Zhang,

Zhou,

Dong

et al. 2024

Macromolecules

View full text Add to dashboard Cite

The rapid evolution of the aerospace industry has ignited an unprecedented surge in the demand for highperformance materials and their accompanying prerequisites. Polyimides (PIs), known for their outstanding comprehensive performance, have proven to be highly valuable as outer protective layers for spacecraft. However, prevailing PI materials still grapple with limitations including insufficient ultraviolet (UV) resistance, inadequate mechanical properties, suboptimal dimensional stability, and challenges in compatibility with other materials. Herein, this work fabricated new intrinsically UV-resistant PI films with greatly enhanced mechanical stability by copolymerization with a low-level introduction of ortho-hydroxybenzophenone diamine. The results show that the incorporation of UV-absorbing groups inhibits the ring-opening reactions of imide groups and promotes the formation of an inert surface during the UV degradation process. The copolyimides maintain excellent mechanical and thermal properties of the Upilex-S PI films and exhibit controllable coefficient of thermal expansion (CTE) values and surface free energy by regulating the molar ratio of diamines, which are significant factors for enhancing performance, compatibility, and durability of composite materials in diverse applications. This work endeavors to establish a relationship among chemical structure, degradation mechanism, and material performance. It provides a valuable foundation for the design of high-performance materials with enhanced UV resistance and comprehensive properties, as well as for the preparation of corresponding composite materials.

show abstract

Section: Resultsmentioning

confidence: 93%

Intrinsically UV-Resistant Copolyimide: Exploring the Impact of UV-Absorbing Groups on Degradation and Comprehensive Performance

Zhang,

Zhou,

Dong

et al. 2024

Macromolecules

View full text Add to dashboard Cite

show abstract

“…Properties of Silicon Methacrylates after UV Cure. Compounds 1 to 7 and selected stars and hyperbranched polymers (10,14,15,17) were formulated with photoinitiator (diphenyl (2,4,6-trimethylbenzoyl) phosphine oxide, TPO) and UV-cured using a 395nm UV LED source to form transparent hardcoats. TPO was used at 2.5% for the monoand dimethacrylates and at 1% for the higher functional methacrylates.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

“…It is well established in the literature that the presence of silicon in both inorganic layers (e.g., silicon itself, silicon dioxide, silicon oxynitride, silicon nitride) and in various organic polymer layers confers resistance to oxygen plasma. − This results from the oxidation of surface silicon to nonvolatile SiO x species with long-range inorganic structures and glassy characteristics vs the oxidation of organics (C, H, O, N, F, Cl) to volatile small molecules more easily eroded from a surface and lost under vacuum conditions . Silicone-polyimide copolymers have been used in low earth orbit (LEO) space applications, exploiting the tendency of the silicone blocks to assemble at the surface and form a glassy protective layer in the presence of atomic oxygen. − Polyhedral oligosilsesquioxanes (POSS) have also received attention in this area, because of their resistance to low earth orbit atomic oxygen, UV, protons and electrons. ,, In our own earlier work on inks for display devices, we built on these insights and used low viscosity hyperbranched polycarbosilane and polycarbosiloxane polymers as physical additives in UV-curable acrylate inks to confer oxygen plasma etch resistance . Contact angle measurements of cured inks with and without additives, taken before and after etching, suggested that additive was present at the polymer–air interface after coating and cure, and after plasma treatment, a more hydrophilic silica-like layer formed (exhibiting lower contact angle and greater hydrophilicity than the same sample before plasma treatment).…”

Section: Introductionmentioning

confidence: 99%

Hybrid Silicon-Organic Methacrylate Monomers and Hyperbranched Polymers that Override the Ohnishi Parameter for Oxygen Plasma Etch Resistance

Hartmann-Thompson,

Lilygren,

Mekonnen

et al. 2024

ACS Appl. Polym. Mater.

View full text Add to dashboard Cite

Efforts to develop next generation UV-curable optical materials for the encapsulation of an OLED, micro-LED, or quantum dot in electronic displays aim for a combination of ever-increasing oxygen plasma etch resistance, inkjet delivery, tailored refractive indices, and mechanical properties ranging from low (flexible) to high modulus. To this end, a range of low viscosity liquid hybrid silicon-organic methacrylates was synthesized and characterized, including mono-and difunctional carbosilanes, tri-and tetrafunctional carbosiloxane stars, and multifunctional hyperbranched polycarbosilane polymers. Ink formulations carrying siliconcontaining methacrylates exhibited greater oxygen plasma etch resistance in comparison to silicon-free controls. Furthermore, it was demonstrated that etch resistance was proportional to weight percent elemental silicon content regardless of methacrylate functionality, molecular architecture, and molecular mass, and that this effect overrode the established empirical indicators of etch resistance for organics such as Ohnishi parameter and ring parameter. In addition, ink refractive indices could be tailored by controlling the phenyl level in the core composition of the star and hyperbranched methacrylates, and average methacrylate functionality, cross-link density, and glass-transition temperature could be controlled to enable either higher modulus layers or lower modulus flexible layers.

show abstract

High-Performance PE/Graphene Composites with Improved Atomic Oxygen Resistance via Synergistic Effect of Graphene Defects and Structure

Gao

Wang

et al. 2023

Preprint

View full text Add to dashboard Cite

High-performance polymer/graphene composites have displayed some potentials for atomic oxygen (AO) resistance in low earth orbit spacecraft. However, such polymer composites have not yet exhibited the desired properties due to the lack of understanding of the protective mechanism. Here, the designed graphene with different kind of defects and structure were successfully synthesized to enhance the polymer, polyethylene (PE) was selected as a model polymer matrix. The theoretical and experimental results revealed that the improved AO resistance originates from synergistic effects of structure defects and exfoliation degree of graphene, where the process of defective graphene binding and stabilizing AO is thermodynamically more favorable, and the higher exfoliation of graphene results in the better dispersion in polymer matrix.Finally, Diameter-Thickness (D/T) was employed as an enhancing descriptor to study the structure-performance relationship of the composites, which is expected to provide the reference to tailor the high-performance polymer composites.

show abstract

In-Situ self-encapsulated flexible multi-layered poly (imide siloxane) copolymer film with resistance to atomic oxygen

Cited by 4 publications

References 27 publications

Intrinsically UV-Resistant Copolyimide: Exploring the Impact of UV-Absorbing Groups on Degradation and Comprehensive Performance

Intrinsically UV-Resistant Copolyimide: Exploring the Impact of UV-Absorbing Groups on Degradation and Comprehensive Performance

Hybrid Silicon-Organic Methacrylate Monomers and Hyperbranched Polymers that Override the Ohnishi Parameter for Oxygen Plasma Etch Resistance

High-Performance PE/Graphene Composites with Improved Atomic Oxygen Resistance via Synergistic Effect of Graphene Defects and Structure

Contact Info

Product

Resources

About