The influence of various growth parameters such as coverage, the AsH 3 flow ͑V/III ratio͒, and growth interrupts on the self-assembled growth of InAs/ GaAs quantum dots ͑QDs͒ by metal organic chemical vapor deposition is reported. Of the various growth parameters, the AsH 3 flow has a particularly strong influence. Higher AsH 3 flows during deposition led to a faster nucleation process and larger islands, while the presence of AsH 3 after nucleation led to continued island ripening. We suggest that this is the result of increased indium redistribution from the highly strained wetting layer to the islands, and possibly between the islands, at higher AsH 3 flows. A large defect density was observed by plan-view transmission electron microscopy, whenever the growth parameters led to larger islands. Using our optimized growth conditions we are able to avoid such defect generation and still achieve a high QD density ͑3 ϫ 10 10 cm −2 ͒.