2000
DOI: 10.1049/el:20000988
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InAs-InGaAs quantum dot VCSELs on GaAs substratesemitting at 1.3 µm

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Cited by 265 publications
(70 citation statements)
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“…The material systems discussed for 1.3−μm light emission include the more traditional InGaAsP [1] and AlGaInAs [2,3] on InP, the more recently investigated InGaAs quantum dots [4][5][6] and low−bandgap GaInNAs on GaAs [7,8], as well as GaAsSb/GaAs [9,10] structures. As an alternative option, strain−compensated InAsP quantum wells separated by the tensile−strain InGaAsP barriers can be used in a VCSEL structure [11].…”
Section: Introductionmentioning
confidence: 99%
“…The material systems discussed for 1.3−μm light emission include the more traditional InGaAsP [1] and AlGaInAs [2,3] on InP, the more recently investigated InGaAs quantum dots [4][5][6] and low−bandgap GaInNAs on GaAs [7,8], as well as GaAsSb/GaAs [9,10] structures. As an alternative option, strain−compensated InAsP quantum wells separated by the tensile−strain InGaAsP barriers can be used in a VCSEL structure [11].…”
Section: Introductionmentioning
confidence: 99%
“…How− ever, their output powers saturate at relatively low levels and therefore their performance is very limited. Hence in− stead of single−QD layers, stacks of several QD layers have been applied [7,8]. Currently, even several such stacks of QD layers are located within a laser active region [9,10].…”
Section: Introductionmentioning
confidence: 99%
“…Two key issues needed to be overcome to push high quality InGaAs QDs towards 1.3 µm: maintenance of a high areal QD density of at least 10 10 cm −2 , an increase of total gain via a stacking process for closely grouped QD layers. This minimum QD density value is based on molecular beam epitaxy (MBE) data, as prior to this work only MBE grown lasers at this wavelength had been reported [Huf98,Muk99,Lot00].…”
Section: Introductionmentioning
confidence: 99%