Optical and morphological properties of self-assembled InAs quantum dots (QDs) covered by In x Ga 1−x As strain reducing layers (SRL) with different thicknesses (2, 4, 6 and 8 nm) and compositions (x=0.13, 0.18 and 0.30) were investigated. Photoluminescence from InAs QDs shows the dependence on indium mole fraction and thickness of the overgrown In x Ga 1−x As SRL. Improvement in PL intensity and narrowing of PL width up to 26 meV occurred together with a red shift of up to 138 nm when the QDs were coved with 6 nm of In 0.18 Ga 0.82 As. Also, we found that when the total amount of InAs deposited to form the QDs and the SRL was larger than a critical value of around 6 MLs, the surface roughness increased and the PL intensity decreased drastically. Keywords: molecular beam epitaxy, photoluminescence, atomic force microscopy, quantum dots, strain reducing layer Classification: Photonics devices, circuits, and systems
References[1] J. Tatebayashi, M. Nishioka, and Y. Arakawa, "Over 1.5 µm light emission from InAs quantum dots embedded in InGaAs strain-reducing layer grown by metalorganic chemical vapor deposition," Appl.