Incomplete Wetting of Nanoscale Thin-Film Structures

Spuller, Matthew; Hess, Dennis W.

doi:10.1149/1.1588303

Cited by 31 publications

(31 citation statements)

References 8 publications

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“…Figure 2 shows X-SEM images of the pillar profiles, from which the pillars dimensions and the geometric factors defined in Eq. [1][2][3] were measured (summarized in Table I). Different treatments were applied to the test structures to vapor adsorptions of decamethyl tetrasiloxane (θ ≈ 70°) and dodecamethyl pentasiloxane (θ ≈ 85°), HMDS-priming (hexamethyldisilazane, θ ≈ 80.5°, on a TEL-Track), vapor phase deposited self-assembled monolayers (SAMs) of PEO (polyethyleneoxide, θ ≈ 30°), CUTS (11-cyanoundecyltrichlorosilane, θ ≈ 70°), PETS (phenethyltrichlorosilane, θ ≈ 83°), BUTS (11-bromoundecyltrichlorosilane, θ ≈ 97°) and FDTS (1H,1H,2H,2H-perfluorodecyltrichlorosilane, θ ≈ 110°).…”

Section: Methodsmentioning

confidence: 99%

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(Invited) Wetting Behavior of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish

Vereecke¹,

Xu²,

Tsai³

et al. 2013

ECS Trans.

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In semiconductor manufacturing, potential wetting issues are becoming a concern as feature dimensions are continuously scaled down and novel materials with different wetting properties are introduced in new technology nodes. The wetting behavior of silicon nanopillars with different dimensions and surface modifications has been studied using static contact angle (θ), attenuated total reflection infra-red spectroscopy (ATR-FTIR), and decoration by etching. The contact angle measurements showed a consistent deviation from the classic wetting models for patterned substrates with an hydrophilic surface termination (60°<θ < 80°). The ATR-FTIR and decoration studies gave evidence for partial wetting under these conditions, resulting from the formation of long-lasting nanobubbles. However the residual gas volumes estimated by ATR-FTIR were too small to explain the contact angle deviations. It is proposed that the apparent extension of the superhydrophobic regime to lower contact angles resulted from modifications caused by the manufacturing process to the wettability of the surface of nanopillars.

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Section: Methodsmentioning

confidence: 99%

“…Wetting of patterned structures has for long not been considered as an issue. The classical view is that aqueous processing of patterned structures is limited by hydrophobic surfaces (θ > 90˚) and long processing times of large size features (1). The former issue is usually tackled by the addition of surfactants.…”

Section: Introductionmentioning

confidence: 99%

(Invited) Wetting Behavior of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish

Vereecke¹,

Xu²,

Tsai³

et al. 2013

ECS Trans.

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“…In such wet cleaning, the surface should be covered by the liquid prior to cleaning. However, in some cases, it is not easy to fully cover fine structures with the liquid (Spuller and Hess, 2003). This could be because surface tension prevents the interface from deforming as necessary (De Gennes et al, 2004), the material to be cleaned has poor wettability, or dead-end structures do not allow gas to escape.…”

Section: Introductionmentioning

confidence: 99%

Observation of liquid infiltration process into closed-end holes by droplet train impingement

Sanada

Furuya

Muraki

et al. 2018

JFST

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Wet cleaning methods using liquids are widely applied in many industrial fields. In such methods, it is first necessary to cover the object to be cleaned with the liquid. However, in structures with small holes, surface tension prevents the deformation of the gas-liquid interface, making it difficult to fill the object with the liquid. We have found that liquid infiltration into such small holes is promoted by the impingement of droplet trains, but the underlying mechanism has not yet been elucidated. In this study, we observed this liquid infiltration process through droplet train impingement into a closed-end hole, and compared the liquid column impact. The filling process was visualized with two high-speed video cameras. Our observations illustrate the importance of the oscillation and deformation of the gas-liquid interface inside the holes following droplet impingement. First, intermittent droplet impingement causes small droplets or large interface deformations to form, and then the gas column inside the hole becomes separated. This separated gas column is then gradually ejected. Therefore, the liquid infiltration can be increased by using a droplet train formed of a small-surface-tension liquid. Furthermore, we investigated the influence of the hole diameter and the uniformity of the droplet train frequency. The results show that droplet train impingement is effective for relatively large holes, although the uniformity of the droplet train frequency has little effect on the liquid infiltration.

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“…5 As the wetting time decreased along with the volume to be wetted, perspectives look positive in this respect. However recent studies have shown that even inherently hydrophilic surfaces (θ < 90…”

mentioning

confidence: 99%

Partial Wetting of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish

Vereecke

Tsai

et al. 2014

ECS J. Solid State Sci. Technol.

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In semiconductor manufacturing, potential wetting issues with aqueous chemistries are becoming a concern as feature dimensions are continuously scaled down and novel materials with different wetting properties are introduced in new technology nodes. The wetting behavior of silicon nanopillars with different dimensions and surface modifications has been studied using static contact angle, decoration by etching, and attenuated total reflection infra-red spectroscopy (ATR-FTIR). The contact angle measurements showed a consistent deviation from the classic wetting models for patterned substrates with an hydrophilic surface termination. Under these conditions the decoration and ATR-FTIR studies gave evidence for partial wetting, with residual gas lasting for more than 30 min. It is proposed that this was resulting from the formation of long-lasting surface nanobubbles localized in-between or at the bottom of nanopillars. On the other hand the residual gas volume estimated by ATR-FTIR seemed too small to explain the contact angle deviations. It is proposed that the apparent extension of the superhydrophobic regime to lower contact angles resulted from modifications of the wettability of the surface of nanopillars caused by the manufacturing process. Both the formation of nanobubbles and the extension of the superhydrophobic regime may present challenges for aqueous cleaning in semiconductor manufacturing.

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Incomplete Wetting of Nanoscale Thin-Film Structures

Cited by 31 publications

References 8 publications

(Invited) Wetting Behavior of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish

(Invited) Wetting Behavior of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish

Observation of liquid infiltration process into closed-end holes by droplet train impingement

Partial Wetting of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish

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