2013
DOI: 10.7567/apex.6.052301
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Indium Phosphide Core–Shell Nanowire Array Solar Cells with Lattice-Mismatched Window Layer

Abstract: We report surface-passivated core–shell InP nanowire array solar cells fabricated using catalyst-free selective-area metal organic vapor phase epitaxy. Reflectance measurements confirm enhanced light absorption due to significantly reduced reflectance over a wide spectral range. The wide-band-gap outer shell layer of core-multishell nanowires effectively passivates the large surface area of the nanowires, increasing the short-circuit current density and elevating the energy conversion efficiency by 6.35% under… Show more

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Cited by 47 publications
(55 citation statements)
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“…Surface passivated core-shell InP NWs array solar cells fabrication using catalyst-free SA-MOVPE was reported by Yoshimura et al [59]. They grew InP core-multishell NWs on SiO 2 masked InP substrate placed in the horizontal MOVPE system.…”
Section: Synthesis Of Indium Phosphide Nanowiresmentioning
confidence: 98%
“…Surface passivated core-shell InP NWs array solar cells fabrication using catalyst-free SA-MOVPE was reported by Yoshimura et al [59]. They grew InP core-multishell NWs on SiO 2 masked InP substrate placed in the horizontal MOVPE system.…”
Section: Synthesis Of Indium Phosphide Nanowiresmentioning
confidence: 98%
“…Semiconductor nanowires (NWs) are promising building blocks for next-generation photovoltaics [1][2][3][4][5] . The nanoscale dimensions of NWs provides strain relaxation capability, enabling heteroepitaxy of III-V materials on Si as well as a higher degree of freedom in the design of multijunction solar cells with lattice-mismatched materials 6,7 .…”
Section: Main Textmentioning
confidence: 99%
“…In the wavelength range between 370 nm and 730 nm, the internal quantum efficiency (IQE) of the device exceeded 80%, despite the device covering only 18% of the substrate surface. The IQE at shorter wavelengths was much higher than the previous reported InP NW solar cell, 16 and the device had peak IQE of 0.943 at 490 nm without employing a window layer for reflecting minority carriers moving toward the front ITO layer. Moreover, the IQE of our heterojunction cell was significantly greater than that of the current world record holder for InP planar cells 23 in the range of 300 nm and 570 nm.…”
mentioning
confidence: 62%
“…16 We grew p-type InP NWs by selective-area MOVPE using a 20-nmthick SiO 2 mask deposited onto p-type InP (111)A substrates (N A $ 5 Â 10 18 cm À3 ). The SiO 2 pattern was designed to be a triangular periodic array of openings with a diameter, d 0 , of 200 nm and pitch, a, of 400 nm in 1.2 Â 1.2 mm 2 regions.…”
mentioning
confidence: 99%