Inductively coupled plasma reactive ion etching of titanium thin films using a Cl2/Ar gas

Xiao, Yu Bin; Kim, Eun Ho; Kong, Seon Mi; Park, Jae Hyun; Min, Byoung‐Chul; Chung, Chee Won

doi:10.1016/j.vacuum.2010.08.006

Cited by 10 publications

(8 citation statements)

References 13 publications

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“…Other studies have reported similar trends, whereby although the etch rate and anisotropy of the etched structures do increase with RF power, its impact is limited compared to effects of other parameters. 27,37 Moreover, the increase generally diminishes beyond a certain value. For example, Parker et al reported that the etch rate did not increase beyond 100 W because titanium etching is more dependent on chemical processes rather than ion sputtering.…”

Section: Resultsmentioning

confidence: 98%

“…Notably, several researchers have reported an increase in the etch rate with an increase in ICP power in masked etching of Ti 26,27,34,37,38 and even in maskless etching. 22 However, that is a difficult conclusion to make in this study due to the height of the structures and their dense distribution, which meant the floor of the substrate was not visible.…”

Section: Resultsmentioning

confidence: 99%

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Bactericidal Anisotropic Nanostructures on Titanium Fabricated by Maskless Dry Etching

Roy

Chatterjee

2022

ACS Appl. Nano Mater.

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Bioinspired nanostructured antibacterial surfaces are among the most promising recent discoveries in nanotechnology to tackle microbial colonization of surfaces, especially with the growing challenge of antimicrobial resistance. Reactive ion etching (RIE) is one of the few nanofabrication techniques that has been demonstrated to be capable of generating biomimetic nanostructures on large substrates through a combination of physical and chemical etching. However, the physics behind the formation of these structures and their spatiotemporal evolution is poorly understood, primarily limited by the challenges associated with placing in situ characterization instruments inside the process chamber. The limited understanding in the field leads to poor reproducibility, constraining the widespread acceptance and application of this technique. This work describes maskless RIE of commercially pure titanium substrates using chlorine and fluorine plasma. It is demonstrated that the chamber condition plays a critical role toward determining the morphology of the nanostructures generated, and high aspect ratio (HAR) nanostructures can be generated reproducibly by following proper cleaning protocols involving fluorine plasma by scavenging the SiOCl species that accumulate in the chamber walls over time. Furthermore, the control of several process parameters to reproducibly fabricate various types of nanostructures such as nanoridges, nanopillars, and nanowires are demonstrated, along with insights into the underlying physical principles. HAR nanopillars are generated, and their bactericidal mechanism and efficiency are shown to be primarily dependent on their aspect ratio. This study provides insights to resolve the hitherto poorly understood events of fabrication of bioinspired nanostructures by RIE with important implications for reliably and reproducibly engineering biomaterial surfaces with bactericidal activity.

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Section: Resultsmentioning

confidence: 98%

Section: Resultsmentioning

confidence: 99%

Bactericidal Anisotropic Nanostructures on Titanium Fabricated by Maskless Dry Etching

Roy

Chatterjee

2022

ACS Appl. Nano Mater.

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“…The first tests performed with process C are displayed in table 3. Parameters were adjusted with respect to parametric studies reported in [11,12,18].…”

Section: Etching Conditions With CL 2 /Ar Chemistry For Titaniummentioning

confidence: 99%

“…In [18], Xiao et al pointed out the optimum parameters in their experimental conditions. It concerned Ti thin films deposited by magnetron sputtering but this also applies to bulk titanium substrates since these conditions are close to those used by Zhao et al in [9,10].…”

Section: Etching Conditions With CL 2 /Ar Chemistry For Titaniummentioning

confidence: 99%

Alternated process for the deep etching of titanium

Tillocher

Lefaucheux

Boutaud³

et al. 2014

J. Micromech. Microeng.

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Titanium is increasingly used as a platform material in microdevices dedicated to biological and bio medical applications. Existing processes for titanium deep etching use a chlorine based chemistry. This paper reports on a low reproducibility for such chemistries when titanium samples are glued onto a silicon carrier wafer. In this case, a SiOCl layer redeposits on the chamber walls as well as on the sample surface. This leads to a decrease of the etch rate and the formation of a very high roughness with a similar morphology as black silicon. The alternated process for the deep etching of titanium (APETi) described in this paper has been designed to improve the overall reproducibility by preventing high roughness formation. It is a time-multiplexed process where Cl2/Ar plasma steps are alternated with SF6 plasma steps. The first step aims at etching with vertical walls (anisotropy) while the second aims at reducing the roughness by removing SiOCl from the sample surface.

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“…It has been demonstrated that a material surface processed at the micro-or nanolevel promotes cellular adhesiveness. [1][2][3] The widely common and most convenient methods of treating materials are etching processes; chemical etching 4,5) and electrochemical etching, 6,7) which are the so-called wet etching techniques, and ion beam processing 8,9) and reactive ion etching, 10,11) which are the so-called dry etching techniques. Many substrates can be created in a short time at a lowcost by wet etching, while a processing with a high aspect ratio is possible with a variety of choices for patterns and materials in dry etching.…”

Section: Introductionmentioning

confidence: 99%

Morphological Observations of Mesenchymal Stem Cell Adhesion to a Nanoperiodic-Structured Titanium Surface Patterned Using Femtosecond Laser Processing

Oya

Aoki

Shimomura

et al. 2012

Jpn. J. Appl. Phys.

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It is known that the adhesive and anisotropic properties of cell-derived biomaterials are affected by micro-or nanoscale structures processed on culture surfaces. In the present study, the femtosecond laser processing technique was used to scan a laser beam at an intensity of approximately the ablation threshold level on a titanium surface for nanoscale processing. Microscopy observation revealed that the processed titanium exhibited a periodic-patterned groove structure at the surface; the width and depth of the groove were 292 AE 50 and 99 AE 31 nm, respectively, and the periodic pitch of the groove was 501 AE 100 nm. Human synovium-derived mesenchymal stem cells were cultured on the surface at a cell density of 3:0 Â 10 3 cells/cm 2 after 4 cell passages. For comparison, the cells were also cultured on a nonprocessed titanium surface under the condition identical to that of the processed surface. Results revealed that the duration for cell attachment to the surface was markedly reduced on the processed titanium as compared with the nonprocessed titanium. Moreover, on the processed titanium, cell extension area significantly increased while cell orientation was aligned along the direction of the periodic grooves. These results suggest that the femtosecond laser processing improves the adhesive and anisotropic properties of cells by producing the nanoperiodic structure on titanium culture surfaces.

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Inductively coupled plasma reactive ion etching of titanium thin films using a Cl2/Ar gas

Cited by 10 publications

References 13 publications

Bactericidal Anisotropic Nanostructures on Titanium Fabricated by Maskless Dry Etching

Bactericidal Anisotropic Nanostructures on Titanium Fabricated by Maskless Dry Etching

Alternated process for the deep etching of titanium

Morphological Observations of Mesenchymal Stem Cell Adhesion to a Nanoperiodic-Structured Titanium Surface Patterned Using Femtosecond Laser Processing

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