Inelastic interactions of electrons with surfaces: application to Auger-electron spectroscopy and X-ray photoelectron spectroscopy

Powell, Cedric J.

doi:10.1016/0039-6028(94)90644-0

Cited by 51 publications

(16 citation statements)

References 159 publications

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“…The nitrogen concentration was four times higher on the CH 3 substrate compared to the PEG substrate. This value can be related to the effective ratio of the amounts of adsorbed collagen on the two substrates, but it is also influenced by the organization of the two protein films 45. For the CH 3 substrate (Figure 3 B), the AFM images show supramolecular structures protruding from a smooth background in a random fashion, as previously observed under similar conditions on a wide range of hydrophobic surfaces 7.…”

Section: Resultssupporting

confidence: 66%

Alignment and Assembly of Adsorbed Collagen Molecules Induced by Anisotropic Chemical Nanopatterns

Denis

Pallandre

Nysten

et al. 2005

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Collagen, a protein widely used to control cell-material interactions, is known to self-assemble in solution. Supramolecular structures also form on material surfaces following collagen adsorption. Herein, we report the use of anisotropic, flat, surface chemical nanopatterns, which consist of alkyl-terminated tracks drawn in an oligo(ethylene glycol)-terminated matrix, to direct collagen adsorption. As revealed by atomic force microscopy, the spontaneous collagen adsorption performed on such patterned substrates results in the accumulation of collagen on the hydrophobic tracks. Moreover, the width of the tracks (30-90 nm), which is much smaller than the length of the collagen molecule (approximately 300 nm), is the origin of preferential alignment of the molecules and of their assembly into continuous bundles of adsorbed collagen. This chemical guidance effect due to self-confinement of proteins upon adsorption may bring novel and valuable applications, specifically in biomaterials science and cell growth control.

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Section: Resultssupporting

confidence: 66%

Alignment and Assembly of Adsorbed Collagen Molecules Induced by Anisotropic Chemical Nanopatterns

Denis

Pallandre

Nysten

et al. 2005

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“…Shelton 24 derived IMFPs for jellium with r s ϭ1.5, 2.0, 3.0, and 4.0 that were based on Lundqvist's calculations. The Quinn 20 and Shelton IMFPs are expected to be reasonable estimates for the so-called free-electron-like solids ͑e.g., elemental solids that are not transition or noble metals͒ where the predominant form of inelastic scattering is plasmon excitation ͑volume or bulk plasmons in the bulk of the solid and surface plasmons near a bulk-vacuum interface 13,[16][17][18] ͒. It should also be noted that the Lundqvist-Shelton IMFPs were computed for relatively low electron energies ͑to a maximum energy of about 500 eV for r s ϭ1.5͒ and to smaller maximum energies for the larger values of r s .…”

Section: Methods For Calculating Electron Imfpsmentioning

confidence: 99%

“…It is convenient to describe inelastic electron scattering in solids by a complex dielectric constant ⑀(,q) which is a function of frequency and momentum transfer q. [11][12][13][14][15][16][17] For qϭ0, the dielectric constant is related to the index of refraction n, the extinction coefficient k, and the optical ͑often x-ray͒ absorption coefficient m by:…”

Section: Electron Inelastic Mean Free Pathsmentioning

confidence: 99%

“…where N is the atomic or molecular density ͑number of atoms or molecules per unit volume͒, e is the electronic charge, and v is the velocity of the incident electrons. [11][12][13][14][15][16][17][18] In the derivation of Eq. ͑2͒, the effects of electron exchange and correlation have been neglected although we will consider corrections for these effects below; the effects are expected to be important for electron energies less than about 200 eV.…”

Section: Sources Of Imfp Valuesmentioning

confidence: 99%

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Evaluation of Calculated and Measured Electron Inelastic Mean Free Paths Near Solid Surfaces

Powell

Jabłoński

1999

Journal of Physical and Chemical Reference Data

475

453

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An analysis is given of the consistency of calculated and measured electron inelastic mean free paths ͑IMFPs͒ near solid surfaces for electron energies between 50 and 10 4 eV, the energy range of relevance for surface analysis by Auger electron spectroscopy and x-ray photoelectron spectroscopy. This evaluation is based on IMFPs calculated from experimental optical data and on IMFPs measured by elastic-peak electron spectroscopy ͑EPES͒. We describe the methods used for the calculations and measurements, and we identify the various sources of uncertainty. Most of our evaluation is based on IMFPs for seven elemental solids ͑Al, Si, Ni, Cu, Ge, Ag, and Au͒ for which there were at least two sources of IMFP calculations and at least two sources of IMFP measurements for each solid. Our comparison of the calculated IMFPs showed a high degree of consistency for Al, Ni, Cu, Ag, and Au. The comparison of measured IMFPs showed greater scatter than for the calculated IMFPs, but reasonable consistency was found for the measured IMFPs of Cu and Ag. The measured IMFPs for four elements ͑Ni, Cu, Ag, and Au͒ showed good consistency with the corresponding calculated IMFPs. It is recommended that IMFPs for these four elements ͑determined from fits of a simple analytic expression to the calculated IMFPs for each element͒ be used as reference values in future EPES experiments. More limited comparisons have been made of calculated and measured IMFPs for four additional elements ͑Fe, Mo, W, and Pt͒ and of calculated IMFPs for six compounds ͑Al 2 O 3 , SiO 2 , KCl, poly͑butene-1-sulfone͒, polyethylene, and polystyrene͒.

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“…Shifts of the Co L 3 M 45 M 45 Auger line show that Co atoms are in different chemical environments [8]. For 23 ML Co/Ge (1 1 1), the Auger line located at 775 eV and entirely comes from pure cobalt on the top Co layers because the inelastic mean free path of Auger electrons is about 1.2 nm [9,10]. Lower kinetic energy of the Co Auger line for 2.7 ML Co/ Ge (1 1 1) is attributed to the larger electronegativity of Ge than Co, while intermixing of Co and Ge occurs at the interface [11].…”

mentioning

confidence: 99%

Magnetic properties of interfacial layers in Co/Ge(111) thin films

Tsay

Chen

Cheng

et al. 2004

Journal of Magnetism and Magnetic Materials

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Inelastic interactions of electrons with surfaces: application to Auger-electron spectroscopy and X-ray photoelectron spectroscopy

Cited by 51 publications

References 159 publications

Alignment and Assembly of Adsorbed Collagen Molecules Induced by Anisotropic Chemical Nanopatterns

Alignment and Assembly of Adsorbed Collagen Molecules Induced by Anisotropic Chemical Nanopatterns

Evaluation of Calculated and Measured Electron Inelastic Mean Free Paths Near Solid Surfaces

Magnetic properties of interfacial layers in Co/Ge(111) thin films

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