Influence of adsorbed sulfur on surface diffusion of potassium on nickel

Błaszczyszyn, M.

doi:10.1016/0039-6028(85)90380-2

Cited by 13 publications

(11 citation statements)

References 15 publications

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“…Unfortunately, the measurement for Εa was not successful. In this case relation (2) gives ΕaS/Ni = 4.82 eV.…”

Section: K-s/nimentioning

confidence: 91%

“…This effect generally is the result of the relatively high work function φ of some single planes of nickel, particularly {111} and {100} (from 5.2 to 5.56 eV and 5.1 to 5.22 eV, respectively [15]) with respect to the ionization potential of potassium I = 4.34 eV. At the beginning of the adsorption the adsorbate could be accumulated on these planes under the diffusion equilibrium conditions [2,16]. In the rough approximation the results are in agreement with the relation The obtained value of Εa+iNi = 2.5 eV is close to other results concerning the activation energy for desorption of potassium, e.g.…”

Section: K/nimentioning

confidence: 99%

“…On the other hand, for the high-index planes (where the work function increases with sulfur coverage) relation (2) can be more correct e.g. for Φ = 4.8 eV relation (2) gives Ε /Νi = 2.54 eV and this can suggest a higher ionic contribution to the Εa+iS/Ni = 2.9 eV (Table).…”

Section: K-s/nimentioning

confidence: 99%

“…In particular, we have investigated the influence of adsorbed sulfur on the self-diffusion of nickel [1] and on the diffusion of potassium on nickel [2]. Those experiments showed that the presence of sulfur on the nickel surface produces increase in the activation energy of the self-diffusion of nickel as well as in the activation energy of the surface diffusion of potassium on nickel.…”

Section: Introductionmentioning

confidence: 99%

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Thermal Desorption of Potassium from Clean and Sulfur Covered Nickel

1995

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Activation energy for thermal desorptioii of potassium from clean and sulfur covered surfaces of nickel was determined by means of the field emission method. For the low potassium coverage limit (θK 0.02) the desorption was detected from the whole emitter surface in the temperature range of 825-1000 K for the atoms and of 725-825 K for the species of atoms and ions of the potassium. The activation energies of neutral desorption were found to be EaNi = 3.8 eV for the clean nickel and Es /Ni = 3.0 eV for the sulfur covered nickel, θs 0.5. The activatioii energies for the desorptioii of the species of atoms and ions increased from E ti = 2.5 eV for the clean nickel to Ea+iS/Ni = 2.9 eV for the sulfur covered nickel θs 0.5. Also, a value of Ea+iS'/Ni = 4.1 eV was found for a higher coverage of sulfur, θs 1. The results are discussed in terms of Gurney model.

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“…Unfortunately, the measurement for Εa was not successful. In this case relation (2) gives ΕaS/Ni = 4.82 eV.…”

Section: K-s/nimentioning

confidence: 91%

Section: K/nimentioning

confidence: 99%

Section: K-s/nimentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Thermal Desorption of Potassium from Clean and Sulfur Covered Nickel

1995

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“…This work is a complement of experimental studies of the surface diffusion which were carried out for small potassium doses corresponding to ÓK = 0.02 on clean nickel [1]. The present result concerns the surface diffusion of higher potassium doses giving the average coverage Θ K = 1.5 on clean nickel , and it was obtained by using the field emission microscopy (FEM) method.…”

Section: Introductionmentioning

confidence: 94%

Diffusion of Potassium on Nickel

Blaszczyszynowa

Błaszczyszyn

1992

Acta Phys. Pol. A

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The surface diffusion of a potassium dose corresponding to the average coverage ΘK = 1.5 on nickel was studied using the field emission technique in the temperature range of 78-133 K. In general, under such conditions diffusion proceeds with the sharp moving boundary and the activation energy Q from 0.16 eV to 0.36 eV dependently on the crystallographic directions. Free boundary migoation with the energy Q < 0.16 eV is expected on the close-packed regions {111) and {001) already at liquid Ν2 temperature. The results are discussed in relation to the atomic structure of the nickel substrate taking into account the interaction in the adsorption layer.

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